Experimental study on roughness and flatness of micromirror fabricated by different anisotropic silicon etching processes - art. no. 683605

	Experimental study on roughness and flatness of micromirror fabricated by different anisotropic silicon etching processes - art. no. 683605
	Xu, J ; Huang, ZX ; Xu, XX ; Wu, YM
刊名	MEMS/MOEMS TECHNOLOGIES AND APPLICATIONS III
	2008
卷号	6836 页码:83605-83605
关键词	SURFACE
ISSN号	0277-786X
通讯作者	Xu, J, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Natl Key Lab Microsyst Technol, State Key Lab Transducer Technol, Shanghai 200050, Peoples R China
学科主题	Optics
收录类别	SCI
语种	英语
公开日期	2011-12-17
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/38570]
专题	上海微系统与信息技术研究所_微系统技术_期刊论文
推荐引用方式 GB/T 7714	Xu, J,Huang, ZX,Xu, XX,et al. Experimental study on roughness and flatness of micromirror fabricated by different anisotropic silicon etching processes - art. no. 683605[J]. MEMS/MOEMS TECHNOLOGIES AND APPLICATIONS III,2008,6836:83605-83605.
APA	Xu, J,Huang, ZX,Xu, XX,&Wu, YM.(2008).Experimental study on roughness and flatness of micromirror fabricated by different anisotropic silicon etching processes - art. no. 683605.MEMS/MOEMS TECHNOLOGIES AND APPLICATIONS III,6836,83605-83605.
MLA	Xu, J,et al."Experimental study on roughness and flatness of micromirror fabricated by different anisotropic silicon etching processes - art. no. 683605".MEMS/MOEMS TECHNOLOGIES AND APPLICATIONS III 6836(2008):83605-83605.