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	Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
	Zhang, Yijun; Ren, Wei; Jiang, Zhuangde; Yang, Shuming; Jing, Weixuan; Shi, Peng; Wu, Xiaoqing; Ye, Zuo-Guang
刊名	JOURNAL OF MATERIALS CHEMISTRY C
	2014
卷号	2期号:[db:dc_citation_issue]页码:7570-7574
ISSN号	2050-7526
DOI	[db:dc_identifier_doi]
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3298087
专题	西安交通大学
推荐引用方式 GB/T 7714	Zhang, Yijun,Ren, Wei,Jiang, Zhuangde,et al. Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure[J]. JOURNAL OF MATERIALS CHEMISTRY C,2014,2([db:dc_citation_issue]):7570-7574.
APA	Zhang, Yijun.,Ren, Wei.,Jiang, Zhuangde.,Yang, Shuming.,Jing, Weixuan.,...&Ye, Zuo-Guang.(2014).Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure.JOURNAL OF MATERIALS CHEMISTRY C,2([db:dc_citation_issue]),7570-7574.
MLA	Zhang, Yijun,et al."Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure".JOURNAL OF MATERIALS CHEMISTRY C 2.[db:dc_citation_issue](2014):7570-7574.

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