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	DC reactively sputtered TiNx thin films for capacitor electrodes
	Sun, Nana; Xu, Jin; Zhou, Dayu; Zhao, Peng; Li, Shuaidong; Wang, Jingjing; Chu, Shichao; Ali, Faizan
刊名	JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
	2018
卷号	29页码:10170-10176
ISSN号	0957-4522
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3264543
专题	大连理工大学
作者单位	1.Dalian Univ Technol, Sch Mat Sci & Engn, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China. 2.Dalian Neusoft Univ Informat, Dept Elect Engn, Dalian 116023, Peoples R China.
推荐引用方式 GB/T 7714	Sun, Nana,Xu, Jin,Zhou, Dayu,et al. DC reactively sputtered TiNx thin films for capacitor electrodes[J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,2018,29:10170-10176.
APA	Sun, Nana.,Xu, Jin.,Zhou, Dayu.,Zhao, Peng.,Li, Shuaidong.,...&Ali, Faizan.(2018).DC reactively sputtered TiNx thin films for capacitor electrodes.JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,29,10170-10176.
MLA	Sun, Nana,et al."DC reactively sputtered TiNx thin films for capacitor electrodes".JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS 29(2018):10170-10176.

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