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	Effects of Annealing on Residual Stress in Ta2O5 Films Deposited by Dual Ion Beam Sputtering
	Lv, Qipeng; Huang, Mingliang; Zhang, Shaoqian; Deng, Songwen; Gong, Faquan; Wang, Feng; Pan, Yanwei; Li, Gang; Jin, Yuqi
刊名	COATINGS
	2018
卷号	8
关键词	dual ion beam sputtering residual stress annealing treatment Ta2O5 film
ISSN号	2079-6412
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3263894
专题	大连理工大学
作者单位	1.Dalian Univ Technol, Sch Mat Sci & Engn, Dalian 116024, Peoples R China. 2.Chinese Acad Sci, Dalian Inst Chem Phys, Key Lab Chem Lasers, Dalian 116023, Peoples R China.
推荐引用方式 GB/T 7714	Lv, Qipeng,Huang, Mingliang,Zhang, Shaoqian,et al. Effects of Annealing on Residual Stress in Ta2O5 Films Deposited by Dual Ion Beam Sputtering[J]. COATINGS,2018,8.
APA	Lv, Qipeng.,Huang, Mingliang.,Zhang, Shaoqian.,Deng, Songwen.,Gong, Faquan.,...&Jin, Yuqi.(2018).Effects of Annealing on Residual Stress in Ta2O5 Films Deposited by Dual Ion Beam Sputtering.COATINGS,8.
MLA	Lv, Qipeng,et al."Effects of Annealing on Residual Stress in Ta2O5 Films Deposited by Dual Ion Beam Sputtering".COATINGS 8(2018).

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