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An ultrathin nickel-based film electrodeposited from a Ni-Tris molecular precursor for highly efficient electrocatalytic water oxidation
Chen, Hu; Gao, Yan; Ye, Lu; Yao, Ya'nan; Wei, Yu; Chen, Xuyang
刊名Electrochimica Acta
2018
卷号283页码:104-110
ISSN号00134686
URL标识查看原文
WOS记录号[DB:DC_IDENTIFIER_WOSID]
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/3239788
专题大连理工大学
作者单位State Key Laboratory of Fine Chemicals, Institute of Artificial Photosynthesis, DUT-KTH Joint Education and Research Center on Molecular Devices, Dalian University of Technology , Dalian, 116024, China
推荐引用方式
GB/T 7714
Chen, Hu,Gao, Yan,Ye, Lu,et al. An ultrathin nickel-based film electrodeposited from a Ni-Tris molecular precursor for highly efficient electrocatalytic water oxidation[J]. Electrochimica Acta,2018,283:104-110.
APA Chen, Hu,Gao, Yan,Ye, Lu,Yao, Ya'nan,Wei, Yu,&Chen, Xuyang.(2018).An ultrathin nickel-based film electrodeposited from a Ni-Tris molecular precursor for highly efficient electrocatalytic water oxidation.Electrochimica Acta,283,104-110.
MLA Chen, Hu,et al."An ultrathin nickel-based film electrodeposited from a Ni-Tris molecular precursor for highly efficient electrocatalytic water oxidation".Electrochimica Acta 283(2018):104-110.
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