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	Atomic layer deposition (ALD) as a way to prepare new mixed-oxide catalyst supports: the case of
	Weng ZH(翁志焕); Francisco Zaera
刊名	Topics in Catalysis
	2019
卷号	62页码:838-848
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3224532
专题	大连理工大学
推荐引用方式 GB/T 7714	Weng ZH,Francisco Zaera. Atomic layer deposition (ALD) as a way to prepare new mixed-oxide catalyst supports: the case of[J]. Topics in Catalysis,2019,62:838-848.
APA	Weng ZH,&Francisco Zaera.(2019).Atomic layer deposition (ALD) as a way to prepare new mixed-oxide catalyst supports: the case of.Topics in Catalysis,62,838-848.
MLA	Weng ZH,et al."Atomic layer deposition (ALD) as a way to prepare new mixed-oxide catalyst supports: the case of".Topics in Catalysis 62(2019):838-848.

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