Two-step electrochemical mechanical polishing of pure copper | |
Wu, Di; Kang, Renke; Niu, Lin; Pan, Bo; Liu, Zuotao; Guo, Jiang | |
刊名 | ECS Journal of Solid State Science and Technology |
2019 | |
卷号 | 8页码:P699-P703 |
ISSN号 | 21628769 |
URL标识 | 查看原文 |
WOS记录号 | [DB:DC_IDENTIFIER_WOSID] |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/3222780 |
专题 | 大连理工大学 |
作者单位 | Key Laboratory for Precision, Non-Traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian, 116024, China |
推荐引用方式 GB/T 7714 | Wu, Di,Kang, Renke,Niu, Lin,et al. Two-step electrochemical mechanical polishing of pure copper[J]. ECS Journal of Solid State Science and Technology,2019,8:P699-P703. |
APA | Wu, Di,Kang, Renke,Niu, Lin,Pan, Bo,Liu, Zuotao,&Guo, Jiang.(2019).Two-step electrochemical mechanical polishing of pure copper.ECS Journal of Solid State Science and Technology,8,P699-P703. |
MLA | Wu, Di,et al."Two-step electrochemical mechanical polishing of pure copper".ECS Journal of Solid State Science and Technology 8(2019):P699-P703. |
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