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	Exploration on the removal of arsenic in silicon under electron beam melting condition
	Wang, Weiyi; Shi, Shuang; Li, Pengting; Jiang, Dachuan; Yang, Yue; Li, Jiayan; Tan, Yi; Asghar, H. M. Noor ul Huda Khan
刊名	VACUUM
	2019
卷号	166页码:191-195
关键词	Electron beam melting arsenic Evaporation Removal Morphology
ISSN号	0042-207X
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3216257
专题	大连理工大学
作者单位	1.Dalian Univ Technol, Sch Mat Sci & Engn, 2 Linggong Rd, Dalian 116023, Peoples R China.,Key Lab Solar Energy Photovolta Syst Liaoning Pro, Dalian 116023, Peoples R China. 2.Balochistan Univ Informat Technol Engn & Manageme, Dept Phys, Quetta 87300, Pakistan.
推荐引用方式 GB/T 7714	Wang, Weiyi,Shi, Shuang,Li, Pengting,et al. Exploration on the removal of arsenic in silicon under electron beam melting condition[J]. VACUUM,2019,166:191-195.
APA	Wang, Weiyi.,Shi, Shuang.,Li, Pengting.,Jiang, Dachuan.,Yang, Yue.,...&Asghar, H. M. Noor ul Huda Khan.(2019).Exploration on the removal of arsenic in silicon under electron beam melting condition.VACUUM,166,191-195.
MLA	Wang, Weiyi,et al."Exploration on the removal of arsenic in silicon under electron beam melting condition".VACUUM 166(2019):191-195.

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