Normally-off hydrogen-terminated diamond field-effect transistor with AL(2)O(3) dielectric layer formed by thermal oxidation of Al | |
Wang, Yan-Feng; Chang, Xiaohui; Zhang, Xiaofan; Fu, Jiao; Fan, Shuwei; Bu, Renan; Zhang, Jingwen; Wang, Wei; Wang, Hong-Xing; Wang, Jingjing | |
刊名 | DIAMOND AND RELATED MATERIALS |
2018 | |
卷号 | 81页码:113-117 |
关键词 | Hydrogen-terminated Diamond film Normally-off MOSFET MPCVD |
ISSN号 | 0925-9635 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2923159 |
专题 | 西安交通大学 |
推荐引用方式 GB/T 7714 | Wang, Yan-Feng,Chang, Xiaohui,Zhang, Xiaofan,et al. Normally-off hydrogen-terminated diamond field-effect transistor with AL(2)O(3) dielectric layer formed by thermal oxidation of Al[J]. DIAMOND AND RELATED MATERIALS,2018,81:113-117. |
APA | Wang, Yan-Feng.,Chang, Xiaohui.,Zhang, Xiaofan.,Fu, Jiao.,Fan, Shuwei.,...&Wang, Jingjing.(2018).Normally-off hydrogen-terminated diamond field-effect transistor with AL(2)O(3) dielectric layer formed by thermal oxidation of Al.DIAMOND AND RELATED MATERIALS,81,113-117. |
MLA | Wang, Yan-Feng,et al."Normally-off hydrogen-terminated diamond field-effect transistor with AL(2)O(3) dielectric layer formed by thermal oxidation of Al".DIAMOND AND RELATED MATERIALS 81(2018):113-117. |
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