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	Conformal deposition of atomic TiO2 layer on chalcogenide nanorod with excellent activity and durability towards solar H-2 generation
	Liu, Maochang; Xue, Fei; Wang, Xixi; Fu, Wenlong; Wang, Yi; Lu, Youjun; Li, Naixu
刊名	CHEMICAL ENGINEERING JOURNAL
	2018
卷号	341页码:335-343
关键词	Photocorrosion Photocatalysis H-2 production Core-shell structure Electron tunneling
ISSN号	1385-8947
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2921732
专题	西安交通大学
推荐引用方式 GB/T 7714	Liu, Maochang,Xue, Fei,Wang, Xixi,et al. Conformal deposition of atomic TiO2 layer on chalcogenide nanorod with excellent activity and durability towards solar H-2 generation[J]. CHEMICAL ENGINEERING JOURNAL,2018,341:335-343.
APA	Liu, Maochang.,Xue, Fei.,Wang, Xixi.,Fu, Wenlong.,Wang, Yi.,...&Li, Naixu.(2018).Conformal deposition of atomic TiO2 layer on chalcogenide nanorod with excellent activity and durability towards solar H-2 generation.CHEMICAL ENGINEERING JOURNAL,341,335-343.
MLA	Liu, Maochang,et al."Conformal deposition of atomic TiO2 layer on chalcogenide nanorod with excellent activity and durability towards solar H-2 generation".CHEMICAL ENGINEERING JOURNAL 341(2018):335-343.

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