Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodes

	Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodes
	He JF(何建芳); Dong LS(董立松); Ye TC(叶甜春); Zhao LJ(赵利俊); Wei YY(韦亚一)
刊名	APPLIED OPTICS
	2018-09-13
文献子类	期刊论文
内容类型	期刊论文
源URL	[http://159.226.55.107/handle/172511/19065]
专题	微电子研究所_集成电路先导工艺研发中心
作者单位	中国科学院微电子研究所
推荐引用方式 GB/T 7714	He JF,Dong LS,Ye TC,et al. Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodes[J]. APPLIED OPTICS,2018.
APA	He JF,Dong LS,Ye TC,Zhao LJ,&Wei YY.(2018).Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodes.APPLIED OPTICS.
MLA	He JF,et al."Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodes".APPLIED OPTICS (2018).