Fabrication of ultra-high aspect ratio (>160:1) silicon nanostructures by using Au metal assisted chemical etching

	Fabrication of ultra-high aspect ratio (>160:1) silicon nanostructures by using Au metal assisted chemical etching
	Shi LN(史丽娜); Xie CQ(谢常青); Li HL(李海亮); Ye TC(叶甜春)
刊名	J. Micromech. Microeng
	2017-11-16
文献子类	期刊论文
内容类型	期刊论文
源URL	[http://159.226.55.106/handle/172511/18135]
专题	微电子研究所_微电子器件与集成技术重点实验室
作者单位	中国科学院微电子研究所
推荐引用方式 GB/T 7714	Shi LN,Xie CQ,Li HL,et al. Fabrication of ultra-high aspect ratio (>160:1) silicon nanostructures by using Au metal assisted chemical etching[J]. J. Micromech. Microeng,2017.
APA	Shi LN,Xie CQ,Li HL,&Ye TC.(2017).Fabrication of ultra-high aspect ratio (>160:1) silicon nanostructures by using Au metal assisted chemical etching.J. Micromech. Microeng.
MLA	Shi LN,et al."Fabrication of ultra-high aspect ratio (>160:1) silicon nanostructures by using Au metal assisted chemical etching".J. Micromech. Microeng (2017).