The annealing behavior of Cu nanoparticles in Ar-ion implanted spinel

doi:10.1016/j.nimb.2010.05.064

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	The annealing behavior of Cu nanoparticles in Ar-ion implanted spinel
	Li, Bingsheng1,2 ; Yang, Yitao1,2 ; Xu, Chaoliang 1,2; Jia, Xiujun 1,2; Zhang, Yong1,2 ; Han, Luhui 1,2; Zhang, Liqing1 ; Zhang, Chonghong1
刊名	NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
	2010-08-15
卷号	268 期号:16 页码:2492-2495
关键词	Cu nanoparticles Surface plasmon resonance absorbance Defects
ISSN号	0168-583X
DOI	10.1016/j.nimb.2010.05.064
英文摘要	Magnesium aluminate spinel crystals (MgAl2O4 (1 1 0)) deposited with 30 nm Cu film on surface were implanted with 110 key Ar-ions to a fluence of 1.0 x 10(17) ions/cm(2) at 350 degrees C, and then annealed in vacuum condition at the temperature of 500, 600, 700, 800 and 900 degrees C for 1 h, respectively. Ultraviolet-visible spectrometry (UV-VIS), scanning electron microscopy (SEM), Rutherford backscattering (RBS) and transmission electron microscopy (TEM) were adopted to analyze the specimens. After implantation, the appearance of surface plasmon resonance (SPR) absorbance peak in the UV-VIS spectrum indicated the formation of Cu nanoparticles, and the TEM results for 500 degrees C also confirmed the formation of Cu nanoparticles at near-surface region. In annealing process, The SPR absorbance intensity increased at 500 and 700 degrees C, decreased with a blue shift of the peak position at 600 and 800 degrees C, and the peak disappeared at 900 degrees C. The SPR absorbance intensity evolution with temperature was discussed combined with other measurement results (RBS, SEM and TEM). (C) 2010 Elsevier B.V. All rights reserved.
资助项目	National Science Foundation of China (NSFC)[10979063] ; National Science Foundation of China (NSFC)[10975165] ; foundation from National Key Laboratory of Nuclear Physics and Technology, Beijing University, China
WOS关键词	GLASSES ; SILICA ; SILVER
WOS研究方向	Instruments & Instrumentation ; Nuclear Science & Technology ; Physics
语种	英语
出版者	ELSEVIER SCIENCE BV
WOS记录号	WOS:000280602500004
资助机构	National Science Foundation of China (NSFC) ; foundation from National Key Laboratory of Nuclear Physics and Technology, Beijing University, China
公开日期	2011-04-20
内容类型	期刊论文
源URL	[http://ir.imp.cas.cn/handle/113462/7761]
专题	近代物理研究所_近代物理研究所知识存储（2010之前）近代物理研究所_材料研究中心近代物理研究所_先进核能材料研究室（ADS）
通讯作者	Yang, Yitao
作者单位	1.Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Peoples R China 2.Chinese Acad Sci, Grad Sch, Beijing 100049, Peoples R China
推荐引用方式 GB/T 7714	Li, Bingsheng,Yang, Yitao,Xu, Chaoliang,et al. The annealing behavior of Cu nanoparticles in Ar-ion implanted spinel[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,2010,268(16):2492-2495.
APA	Li, Bingsheng.,Yang, Yitao.,Xu, Chaoliang.,Jia, Xiujun.,Zhang, Yong.,...&Zhang, Chonghong.(2010).The annealing behavior of Cu nanoparticles in Ar-ion implanted spinel.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,268(16),2492-2495.
MLA	Li, Bingsheng,et al."The annealing behavior of Cu nanoparticles in Ar-ion implanted spinel".NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 268.16(2010):2492-2495.