Preparation of single-crystal TiC (111) by radio frequency magnetron sputtering at low temperature

doi:10.1016/j.tsf.2012.07.040

	Preparation of single-crystal TiC (111) by radio frequency magnetron sputtering at low temperature
	Qi, Q.; Zhang, W. Z.; Shi, L. Q.; Zhang, W. Y.; Zhang, W.; Zhang, B.
刊名	THIN SOLID FILMS
	2012-09-30
卷号	520 页码:6882-6887
关键词	Titanium Carbide Radio-frequency Magnetron Sputtering Rutherford Backscattering Spectroscopy X-ray Diffraction
ISSN号	0040-6090
DOI	10.1016/j.tsf.2012.07.040
文献子类	Article
英文摘要	Single-crystal films of TiC (111) have been synthesized at room temperature on Al2O3 (0001) substrates by radio frequency magnetron sputtering using a compound Ti-C target. The substrate temperature and bias were varied to explore the influence of deposition parameters on the crystal structure. Both Al2O3 (0001) and Si (100) substrates were used for epitaxial growth of TiC films. A series of characterizations of TiC films were carried out, including Rutherford backscattering spectroscopy, X-ray diffraction, Raman and X-ray photoelectron spectroscopy. Single-crystal films of TiC (111) on the Al2O3 (0001) were demonstrated. (C) 2012 Elsevier B.V. All rights reserved.
WOS关键词	TITANIUM CARBIDE ; THIN-FILMS ; DEPOSITION ; TI3SIC2 ; SPECTROSCOPY ; COATINGS
语种	英语
出版者	ELSEVIER SCIENCE SA
WOS记录号	WOS:000308207000010
内容类型	期刊论文
源URL	[http://119.78.100.186/handle/113462/47788]
专题	中国科学院近代物理研究所
通讯作者	Shi, L. Q.
作者单位	Fudan Univ, Inst Modern Phys, Appl Ion Beam Phys Lab, Shanghai 200433, Peoples R China
推荐引用方式 GB/T 7714	Qi, Q.,Zhang, W. Z.,Shi, L. Q.,et al. Preparation of single-crystal TiC (111) by radio frequency magnetron sputtering at low temperature[J]. THIN SOLID FILMS,2012,520:6882-6887.
APA	Qi, Q.,Zhang, W. Z.,Shi, L. Q.,Zhang, W. Y.,Zhang, W.,&Zhang, B..(2012).Preparation of single-crystal TiC (111) by radio frequency magnetron sputtering at low temperature.THIN SOLID FILMS,520,6882-6887.
MLA	Qi, Q.,et al."Preparation of single-crystal TiC (111) by radio frequency magnetron sputtering at low temperature".THIN SOLID FILMS 520(2012):6882-6887.