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	A novel low aspect-ratio Si nano-hemisphere surface texturing scheme for ultrathin film solar cells
	Li, Y.L. ; Yu, H.Y. ; Li, J.S. ; Wong, S.M. ; Zhu, H.L. ; Singh, N. ; Lo, Patrick G.Q. ; Kwong, D.L.
	2011
英文摘要	Low aspect-ratio Si nano-hemisphere array surface texturing compatible to ultrathin film solar cells is proposed and experimentally studied for both optical and electrical performance improvements. Light reflection can be significantly suppressed through rationally designed nano-hemisphere array surface texturing, thanks to the spatial effective refractive index (n eff) modulation. Owing to the excellent light trapping and also to the nature of low aspect ratio (critical for conformal deposition of electrodes and achieving low surface defects), a record-high short circuit current density (Jsc) of 37.4 mA/cm2 among all published Si nano-structured solar cells is achieved, in distinct comparison with J sc of 20.7mA/cm2 measured from the reference flat solar cells. ? 2011 IEEE.; EI; 0
语种	英语
DOI标识	10.1109/IEDM.2011.6131477
内容类型	其他
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/327395]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	Li, Y.L.,Yu, H.Y.,Li, J.S.,et al. A novel low aspect-ratio Si nano-hemisphere surface texturing scheme for ultrathin film solar cells. 2011-01-01.

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