QQ客服 官方微博 反馈留言

	羧基负离子型聚电解质与重氮树脂的自组装及自组装膜的光和热反应; The self-assembly films from diazoresin and carboxy-containing polyelectrolytes and their photo- and thermal reactions
	罗皡 ; 陈金玉 ; 罗国斌 ; 陈燕宁 ; 曹维孝
	1999
关键词	重氮树脂 负离子聚电解质 自组装膜 光热反应 dizazoresin anionic polyelectrolytes self-assembly films photochemical and thermal reaction
英文摘要	The multilayer films from diazoresin (DR) and poly(sodium acrylate, PANa) or alkali hydrolytic maleic anhydride/styrene copolymer (PMSNa) were fabricated on mica. During the fabrication process the absorbance increases about 0\^033 for every fabrication cycle, indicating that the thickness of the fi...; The multilayer films from diazoresin (DR) and poly(sodium acrylate, PANa) or alkali hydrolytic maleic anhydride/styrene copolymer (PMSNa) were fabricated on mica. During the fabrication process the absorbance increases about 0.033 for every fabrication cycle, indicating that the thickness of the film increases regularly. Under irradiation of UV light or heating, following the -N-2(+) decomposition, the inoic bond of the film converts to covalent bond. The morphologies of the film after DMF etching for the different films (irradiatied or unirradiated etc) were observed by Atomic Force Microscopy (AFM) and the result shows that the ability of the film against etching from polar solvent increases obviously. The conversion of bond nature from ionic to covalent was verified preliminarily by FTIR spectral analysis.; http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000084643000023&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=8e1609b174ce4e31116a60747a720701 ; SCI(E); 中文核心期刊要目总览(PKU); 中国科学引文数据库(CSCD); 5; 06; 770-773
语种	中文
出处	SCI ; 知网
出版者	高分子学报
内容类型	其他
源URL	[http://hdl.handle.net/20.500.11897/79781]
专题	化学与分子工程学院
推荐引用方式 GB/T 7714	罗皡,陈金玉,罗国斌,等. 羧基负离子型聚电解质与重氮树脂的自组装及自组装膜的光和热反应, The self-assembly films from diazoresin and carboxy-containing polyelectrolytes and their photo- and thermal reactions. 1999-01-01.

个性服务

查看访问统计

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。