基于磁流变技术的微孔内壁抛光装置研制及性能研究

doi:10.16490/j.cnki.issn.1001-3660.2018.06.036

	基于磁流变技术的微孔内壁抛光装置研制及性能研究
	Yue, Zhou; Yu-Ting, Wang; Fu-Ting, Yi; Bo, Wang; Jing, Liu; Tian-Chong, Zhang; 张天冲; 刘静; 王波; 伊福廷
刊名	表面技术
	2018
卷号	47 期号:6 页码:252-257
DOI	10.16490/j.cnki.issn.1001-3660.2018.06.036
其他题名	Development and performance of equipment for polishing inside walls of micro-holes based on magnetic-field-assisted polishing technology
文献子类	Article
英文摘要	The work aims to develop equipment for polishing inside walls of micro-holes based on magnetic-field-assisted polishing technology. The polishing equipment applicable to inside walls of micro-holes was designed and developed by utilizing properties of magnetic-field-assisted polishing solution and drawing on traditional polishing theory. Based upon this polishing equipment, a series of performance studies were performed to the equipment. Polishing studies were applied to porous nickel samples and normal silicon wafers under different conditions, and polishing results were analyzed. Performance study results of the polishing equipment showed that stable gradient alternating magnetic field was generated by the equipment, which coincided with our expectation and could be used for further studies of sample polishing. Though the equipment had no obvious effect on polishing of porous nickel samples, the roughness of silicon wafers decreased from 1.24 nm to 0.56 nm. Polishing studies of silicon wafers showed that the roughness decreased as time advanced. The self-made equipment for polishing inside walls of micro-holes based on magnetic-field-assisted polishing technology can be used for polishing silicon wafers. The relationship between polishing effect and magnetic field control parameters can be explored subsequently, and the polishing equipment can be applied to polishing of samples with micro-hole structure step by step. © 2018 Chongqing Wujiu Periodicals Press. All rights reserved.
电子版国际标准刊号	1001-3660
语种	中文
CSCD记录号	CSCD:6312938
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/286643]
专题	高能物理研究所_多学科研究中心
通讯作者	张天冲
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Yue, Zhou,Yu-Ting, Wang,Fu-Ting, Yi,等. 基于磁流变技术的微孔内壁抛光装置研制及性能研究[J]. 表面技术,2018,47(6):252-257.
APA	Yue, Zhou.,Yu-Ting, Wang.,Fu-Ting, Yi.,Bo, Wang.,Jing, Liu.,...&周悦.(2018).基于磁流变技术的微孔内壁抛光装置研制及性能研究.表面技术,47(6),252-257.
MLA	Yue, Zhou,et al."基于磁流变技术的微孔内壁抛光装置研制及性能研究".表面技术 47.6(2018):252-257.