Secondary electron yield of nano-thick aluminum oxide and its application on MCP detector | |
Zhao TC(赵天池); Wang PL(王佩良); Heng, Yuekun; Wang, Peiliang; Zhao, Tianchi; Yang, Yuzhen; Wen, Kaile; Liu, Shulin; Yan, Baojun; Heng YK(衡月昆) | |
刊名 | SPRINGER PROCEEDINGS IN PHYSICS |
2018 | |
卷号 | 213页码:339-343 |
ISSN号 | 0930-8989 |
DOI | 10.1007/978-981-13-1316-5_63 |
文献子类 | Proceedings Paper |
英文摘要 | Nano-thick aluminum oxide thin film was deposited by atomic layer deposition (ALD) technique. The secondary electron properties of such thin film have been studied by pulsed-yield measurement. Conventional lead glass microchannel plate (MCP) was coated with such thin film. The gain, the single electron resolution and the peak-to-valley ratio of the new MCP detector were improved. © Springer Nature Singapore Pte Ltd. 2018. |
电子版国际标准刊号 | 1867-4941 |
会议地点 | Beijing, China |
语种 | 英语 |
内容类型 | 期刊论文 |
源URL | [http://ir.ihep.ac.cn/handle/311005/286600] |
专题 | 高能物理研究所_实验物理中心 高能物理研究所_多学科研究中心 |
通讯作者 | Yan BJ(闫保军) |
作者单位 | 中国科学院高能物理研究所 |
推荐引用方式 GB/T 7714 | Zhao TC,Wang PL,Heng, Yuekun,et al. Secondary electron yield of nano-thick aluminum oxide and its application on MCP detector[J]. SPRINGER PROCEEDINGS IN PHYSICS,2018,213:339-343. |
APA | 赵天池.,王佩良.,Heng, Yuekun.,Wang, Peiliang.,Zhao, Tianchi.,...&杨玉珍.(2018).Secondary electron yield of nano-thick aluminum oxide and its application on MCP detector.SPRINGER PROCEEDINGS IN PHYSICS,213,339-343. |
MLA | 赵天池,et al."Secondary electron yield of nano-thick aluminum oxide and its application on MCP detector".SPRINGER PROCEEDINGS IN PHYSICS 213(2018):339-343. |
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