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Electronic sputtering of metals and insulators by swift heavy ions
Toulemonde, M; Assmann, W; Trautmann, C; Gruner, F; Mieskes, HD; Kucal, H; Wang, ZG
刊名NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
2003-12-01
卷号212页码:346-357
ISSN号0168-583X
DOI10.1016/S0168-583X(03)01721-X
通讯作者Toulemonde, M(toulemonde@ganil.fr)
英文摘要Angular distributions and total yields of atoms sputtered from crystals of LiF and alpha-SiO(2) quartz and from Ti, Zr and Au targets are measured under the irradiation of different heavy ions in the electronic energy loss (S(e)) regime. The angular distributions for Si atoms sputtered from SiO(2) are nearly isotropic (similar to cos theta), whereas all metallic targets follow an overcosine law (similar to cos(3) theta). In case of LiF, an isotropic distribution is found to be superimposed by an anisotropic jet-like component peaked normal to the sample surface. The sputter yield of different targets varies by several orders of magnitude from 10 for metals to 10(5) for LiF. As a function of the electronic energy loss of the projectiles, the total sputter yield follows a (S(e))(4) law for LiF. Experimental sputter yields are analyzed within the inelastic thermal spike approach. Good agreement is obtained for alpha-SiO(2) when using the same set of parameters which successfully describe track formation. To model sputtering yield in metals, both contributions of electronic and nuclear collisions have to be taken into account. The sputtering mechanism of LiF seems to be more complex, possibly combining a hydrodynamic process generated by a transient thermal effect associated with a decrease of the surface binding energy. (C) 2003 Elsevier B.V. All rights reserved.
收录类别SCI ; ISTP
WOS关键词TRANSIENT THERMAL-PROCESS ; ELASTIC-COLLISION SPIKES ; STOPPING POWER ; MOLECULAR-DYNAMICS ; CYLINDRICAL TRACK ; DAMAGE CREATION ; CHARGE-STATE ; IRRADIATION ; YIELDS ; DEPENDENCE
WOS研究方向Instruments & Instrumentation ; Nuclear Science & Technology ; Physics
WOS类目Instruments & Instrumentation ; Nuclear Science & Technology ; Physics, Atomic, Molecular & Chemical ; Physics, Nuclear
语种英语
出版者ELSEVIER SCIENCE BV
WOS记录号WOS:000186673700058
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2556836
专题寒区旱区环境与工程研究所
通讯作者Toulemonde, M
作者单位1.CIRIL, Lab Commun CEA, CNRS, ISMRA, F-14070 Caen 5, France
2.LMU Munchen, Sekt Phys, D-85748 Garching, Germany
3.GSI, Mat Forsch, D-64291 Darmstadt, Germany
4.Chinese Acad Sci, IMP, Lanzhou 730000, Peoples R China
推荐引用方式
GB/T 7714
Toulemonde, M,Assmann, W,Trautmann, C,et al. Electronic sputtering of metals and insulators by swift heavy ions[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,2003,212:346-357.
APA Toulemonde, M.,Assmann, W.,Trautmann, C.,Gruner, F.,Mieskes, HD.,...&Wang, ZG.(2003).Electronic sputtering of metals and insulators by swift heavy ions.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,212,346-357.
MLA Toulemonde, M,et al."Electronic sputtering of metals and insulators by swift heavy ions".NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 212(2003):346-357.
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