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Studies of photosensitive alignment layer based on ladder-like polysilsequioxane liquid-crystal devices using atomic force microscopy/force curve
Zhu, CF; Shang, GY; Li, BS; Wang, C; Cui, L; Xie, P; Zhang, RB
刊名SURFACE AND INTERFACE ANALYSIS
2003-05-01
卷号35期号:5页码:459-462
关键词Photosensitive Thin Film Adhesion Force
ISSN号0142-2421
DOI10.1002/sia.1555
英文摘要Atomic force microscopy (AFM)/force curve measurements were used to study the photochemical process of UV-treated (0, 10, 20, 30 and 60 min) organic thin films that were prepared from azobenzene and cinnamate side-chain co-grafted ladder-like polysilsequioxanes (LPS). The morphological data of the thin films describe the changing process on the surface of the thin film. The statistical results of the adhesion force of the thin films further demonstrate the intermolecular characteristics of the thin films. A photosensitive thin film after UV exposure for 20 min would be a better material with a preferred orientation that can be used to make liquid-crystal devices. Copyright (C) 2003 John Wiley Sons, Ltd.
语种英语
出版者JOHN WILEY & SONS LTD
WOS记录号WOS:000182909700008
内容类型期刊论文
源URL[http://ir.iccas.ac.cn/handle/121111/79725]  
专题中国科学院化学研究所
通讯作者Wang, C
作者单位Chinese Acad Sci, Inst Chem, Ctr Mol Sci, Beijing 100080, Peoples R China
推荐引用方式
GB/T 7714
Zhu, CF,Shang, GY,Li, BS,et al. Studies of photosensitive alignment layer based on ladder-like polysilsequioxane liquid-crystal devices using atomic force microscopy/force curve[J]. SURFACE AND INTERFACE ANALYSIS,2003,35(5):459-462.
APA Zhu, CF.,Shang, GY.,Li, BS.,Wang, C.,Cui, L.,...&Zhang, RB.(2003).Studies of photosensitive alignment layer based on ladder-like polysilsequioxane liquid-crystal devices using atomic force microscopy/force curve.SURFACE AND INTERFACE ANALYSIS,35(5),459-462.
MLA Zhu, CF,et al."Studies of photosensitive alignment layer based on ladder-like polysilsequioxane liquid-crystal devices using atomic force microscopy/force curve".SURFACE AND INTERFACE ANALYSIS 35.5(2003):459-462.
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