Iron Carbidization on Thin-Film Silica and Silicon: A Near-Ambient-Pressure X-ray Photoelectron Spectroscopy and Scanning Tunneling Microscopy Study

doi:10.1021/acscatal.8b02076

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	Iron Carbidization on Thin-Film Silica and Silicon: A Near-Ambient-Pressure X-ray Photoelectron Spectroscopy and Scanning Tunneling Microscopy Study
	Zhou, Xiong 1,2; Mannie, Gilbere J. A.1; Yin, Junqing 1; Yu, Xin 1,2; Weststrate, C. J.3; Wen, Xiaodong 1,2; Wu, Kai 4; Yang, Yong 1,2; Li, Yongwang 1,2; Niemantsverdriet, J. W.1,3
刊名	ACS CATALYSIS
	2018-08-01
卷号	8 期号:8 页码:7326-7333
关键词	Iron Carbidization Interface Effect Nap-xps Surface Reaction Model Catalyst
ISSN号	2155-5435
DOI	10.1021/acscatal.8b02076
英文摘要	Model catalysts consisting of iron particles with similar size deposited on thin-film silica (Fe/SiO2) and on silicon (Fe/Si) were used to study iron carbidization in a CO atmosphere using in situ near ambient -pressure X-ray photoelectron spectroscopy. Significant differences were observed for CO adsorption, CO dissociation, and iron carbidization when the support was changed from thin-film silica to silicon. Stronger adsorption of CO on Fe/Si than that on Fe/SiO2 was evident from the higher CO equilibrium coverage found at a given temperature in the presence of 1 mbar of CO gas. On thin-film silica, iron starts to carbidize at 150 degrees C, while the onset of carbidization is at 100 degrees C on the silicon support. The main reason for the different onset temperature for carbidization is the efficiency of removal of oxygen species after CO dissociation. On thin-film silica, oxygen species formed by CO dissociation block the iron surface until similar to 150 degrees C, when CO2 formation removes surface oxygen. Instead, on the silicon support, oxygen species readily spill over to the silicon. As a consequence, oxygen removal is not rate-limiting anymore and carbidization of iron can proceed at a lower temperature.
语种	英语
出版者	AMER CHEMICAL SOC
WOS记录号	WOS:000441112400051
内容类型	期刊论文
源URL	[http://ir.iccas.ac.cn/handle/121111/42293]
专题	中国科学院化学研究所
通讯作者	Zhou, Xiong
作者单位	1.Synfuels China Technol Co Ltd, SynCat Beijing, Leyuan South St 2,1, Beijing 101407, Peoples R China 2.Chinese Acad Sci, Inst Coal Chem, State Key Lab Coal Convers, Taiyuan 030001, Shanxi, Peoples R China 3.Syngaschem BV, SynCat DIFFER, POB 6336, NL-5600 HH Eindhoven, Netherlands 4.Peking Univ, Beijing Natl Lab Mol Sci, Coll Chem & Mol Engn, Beijing 100871, Peoples R China
推荐引用方式 GB/T 7714	Zhou, Xiong,Mannie, Gilbere J. A.,Yin, Junqing,et al. Iron Carbidization on Thin-Film Silica and Silicon: A Near-Ambient-Pressure X-ray Photoelectron Spectroscopy and Scanning Tunneling Microscopy Study[J]. ACS CATALYSIS,2018,8(8):7326-7333.
APA	Zhou, Xiong.,Mannie, Gilbere J. A..,Yin, Junqing.,Yu, Xin.,Weststrate, C. J..,...&Niemantsverdriet, J. W..(2018).Iron Carbidization on Thin-Film Silica and Silicon: A Near-Ambient-Pressure X-ray Photoelectron Spectroscopy and Scanning Tunneling Microscopy Study.ACS CATALYSIS,8(8),7326-7333.
MLA	Zhou, Xiong,et al."Iron Carbidization on Thin-Film Silica and Silicon: A Near-Ambient-Pressure X-ray Photoelectron Spectroscopy and Scanning Tunneling Microscopy Study".ACS CATALYSIS 8.8(2018):7326-7333.