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Vls growth of siox nanowires with a stepwise nonuniformity in diameter
Huang, Shengli1,2; Wu, Yan1,2,3; Zhu, Xianfang1,2,4,5; Li, Lunxiong1,2; Wang, Zhanguo4; Wang, Lianzhou1,2,5; Lu, Gaoqing1,2,5
刊名Journal of applied physics
2011-04-15
卷号109期号:8页码:5
ISSN号0021-8979
DOI10.1063/1.3574398
通讯作者Zhu, xianfang(zhux@xmu.edu.cn)
英文摘要With a precise control of temperature, gas flow, and pressure and with sequentially increased durations for reactions, the detailed processes of catalyzing, nucleation, and growth of the siox nanowires were successfully traced. especially a stepwise nonuniformity in diameter of nanowire during the growth was for the first time detected. with analysis of these detailed processes via nanocurvature and nano ripening effects, a further understanding of the vapor-liquid-solid mechanism was achieved and a novel mechanism for formation of the stepwise nonuniformity in diameter of nanowire was particularly proposed. all these will be the crucial basis for the further, accurately controlled growth of siox nanowires and the relevant applications. (c) 2011 american institute of physics. [doi:10.1063/1.3574398]
WOS关键词SILICON NANOWIRES ; SURFACE MIGRATION ; NANOSTRUCTURES ; CATALYST
WOS研究方向Physics
WOS类目Physics, Applied
语种英语
出版者AMER INST PHYSICS
WOS记录号WOS:000290047000179
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2428159
专题半导体研究所
通讯作者Zhu, Xianfang
作者单位1.Xiamen Univ, China Australia Joint Lab Funct Nanomat, Xiamen 361005, Peoples R China
2.Xiamen Univ, Dept Phys, Xiamen 361005, Peoples R China
3.Jimei Univ, Dept Phys, Xiamen 361021, Peoples R China
4.Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100083, Peoples R China
5.Univ Queensland, ARC Ctr Excellence Funct Nanomat, Brisbane, Qld 4072, Australia
推荐引用方式
GB/T 7714
Huang, Shengli,Wu, Yan,Zhu, Xianfang,et al. Vls growth of siox nanowires with a stepwise nonuniformity in diameter[J]. Journal of applied physics,2011,109(8):5.
APA Huang, Shengli.,Wu, Yan.,Zhu, Xianfang.,Li, Lunxiong.,Wang, Zhanguo.,...&Lu, Gaoqing.(2011).Vls growth of siox nanowires with a stepwise nonuniformity in diameter.Journal of applied physics,109(8),5.
MLA Huang, Shengli,et al."Vls growth of siox nanowires with a stepwise nonuniformity in diameter".Journal of applied physics 109.8(2011):5.
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