Growth and Electronic Application of p-Undoped Freestanding Diamond Film | |
Huang Jian[1]; Liu Jianmin[2]; Wang Linjun[3]; Xu Run[4]; Shi Weimin[5]; Xia Yiben[6] | |
刊名 | PLASMA SCIENCE & TECHNOLOGY |
2009 | |
卷号 | 11页码:302-306 |
关键词 | freestanding diamond heterojunction MPCVD ZnO |
ISSN号 | 1009-0630 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2322304 |
专题 | 上海大学 |
作者单位 | 1.[1]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China. 2.[2]Jingdezhen Ceram Inst, Jingdezhen 333403, Peoples R China. 3.[3]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China. 4.[4]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China. 5.[5]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China. 6.[6]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China. |
推荐引用方式 GB/T 7714 | Huang Jian[1],Liu Jianmin[2],Wang Linjun[3],et al. Growth and Electronic Application of p-Undoped Freestanding Diamond Film[J]. PLASMA SCIENCE & TECHNOLOGY,2009,11:302-306. |
APA | Huang Jian[1],Liu Jianmin[2],Wang Linjun[3],Xu Run[4],Shi Weimin[5],&Xia Yiben[6].(2009).Growth and Electronic Application of p-Undoped Freestanding Diamond Film.PLASMA SCIENCE & TECHNOLOGY,11,302-306. |
MLA | Huang Jian[1],et al."Growth and Electronic Application of p-Undoped Freestanding Diamond Film".PLASMA SCIENCE & TECHNOLOGY 11(2009):302-306. |
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