Influence of the pore types of mesoporous SiO2on material removal during CMP by molecular dynamics simulation | |
Wang, Y.[1]; Chen, R.L.[2]; Lei, H.[3]; Jiang, R.R.[4]; Lu, X.C.[5] | |
2016 | |
会议名称 | 3rd Annual International Conference on Material Science and Engineering, ICMSE 2015 |
会议日期 | 2015-05-15 |
页码 | 389-396 |
URL标识 | 查看原文 |
内容类型 | 会议论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2225112 |
专题 | 上海大学 |
作者单位 | [1]Nano-science and Nano-technology Research Center, Shanghai University, Shanghai, China [2]Nano-science and Nano-technology Research Center, Shanghai University, Shanghai, China [3]Nano-science and Nano-technology Research Center, Shanghai University, Shanghai, China [4]Nano-science and Nano-technology Research Center, Shanghai University, Shanghai, China [5]State Key Laboratory of Tribology, Tsinghua University, Beijing, China |
推荐引用方式 GB/T 7714 | Wang, Y.[1],Chen, R.L.[2],Lei, H.[3],et al. Influence of the pore types of mesoporous SiO2on material removal during CMP by molecular dynamics simulation[C]. 见:3rd Annual International Conference on Material Science and Engineering, ICMSE 2015. 2015-05-15. |
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