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Influence of the pore types of mesoporous SiO2on material removal during CMP by molecular dynamics simulation
Wang, Y.[1]; Chen, R.L.[2]; Lei, H.[3]; Jiang, R.R.[4]; Lu, X.C.[5]
2016
会议名称3rd Annual International Conference on Material Science and Engineering, ICMSE 2015
会议日期2015-05-15
页码389-396
URL标识查看原文
内容类型会议论文
URI标识http://www.corc.org.cn/handle/1471x/2225112
专题上海大学
作者单位[1]Nano-science and Nano-technology Research Center, Shanghai University, Shanghai, China [2]Nano-science and Nano-technology Research Center, Shanghai University, Shanghai, China [3]Nano-science and Nano-technology Research Center, Shanghai University, Shanghai, China [4]Nano-science and Nano-technology Research Center, Shanghai University, Shanghai, China [5]State Key Laboratory of Tribology, Tsinghua University, Beijing, China
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Wang, Y.[1],Chen, R.L.[2],Lei, H.[3],et al. Influence of the pore types of mesoporous SiO2on material removal during CMP by molecular dynamics simulation[C]. 见:3rd Annual International Conference on Material Science and Engineering, ICMSE 2015. 2015-05-15.
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