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	Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO₂ Super-Lattice
	Ma Hong-Ping[1]; Yang Jia-He[2]; Yang Jian-Guo[3]; Zhu Li-Yuan[4]; Huang Wei[5]; Yuan Guang-Jie[6]; Feng Ji-Jun[7]; Jen Tien-Chien[8]; Lu Hong-Liang[9]
刊名	Nanomaterials (Basel, Switzerland)
	2019
卷号	9页码:1-13
关键词	SiO2 SiOx plasma-enhanced atomic layer deposition (PEALD) stoichiometry superlattice
ISSN号	2079-4991
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2164642
专题	上海大学
作者单位	1.State Key Laboratory of ASIC and System, Shanghai Institute of Intelligent Electronics & Systems, School of Microelectronics, Fudan University, Shanghai 200433, China. 18212020044@fudan.edu.cn. 2.State Key Laboratory of ASIC and System, Shanghai Institute of Intelligent Electronics & Systems, School of Microelectronics, Fudan University, Shanghai 200433, China. 18212020054@fudan.edu.cn. 3.State Key Laboratory of ASIC and System, Shanghai Institute of Intelligent Electronics & Systems, School of Microelectronics, Fudan University, Shanghai 200433, China. eehuangw@fudan.edu.cn. 4.SMIT Center, School of Automation and Mechanical Engineering, Shanghai University, Shanghai 201800, China. guangjie@shu.edu.cn. 5.Shanghai Key Laboratory of Modern Optical System, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China. fjijun@usst.edu.cn. 6.Department of Mechanical Engineering Science, University of Johannesburg, Johannesburg ZA-2006, South Africa. tjen@uj.ac.za.
推荐引用方式 GB/T 7714	Ma Hong-Ping[1],Yang Jia-He[2],Yang Jian-Guo[3],et al. Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO₂ Super-Lattice[J]. Nanomaterials (Basel, Switzerland),2019,9:1-13.
APA	Ma Hong-Ping[1].,Yang Jia-He[2].,Yang Jian-Guo[3].,Zhu Li-Yuan[4].,Huang Wei[5].,...&Lu Hong-Liang[9].(2019).Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO₂ Super-Lattice.Nanomaterials (Basel, Switzerland),9,1-13.
MLA	Ma Hong-Ping[1],et al."Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO₂ Super-Lattice".Nanomaterials (Basel, Switzerland) 9(2019):1-13.

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