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Manufacturing Graphene-Encapsulated Copper Particles by Chemical Vapor Deposition in a Cold Wall Reactor
Chen, Shujing[1]; Zehri, Abdelhafid[2]; Wang, Qianlong[3]; Yuan, Guangjie[4]; Liu, Xiaohua[5]; Wang, Nan[6]; Liu, Johan[7]
刊名CHEMISTRYOPEN
2019
卷号8页码:58-63
关键词cold wall reactor copper particles graphene oxidation resistance thermal conductivity
ISSN号2191-1363
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2164073
专题上海大学
作者单位1.[1]Shanghai Univ, SMIT Ctr, Sch Mechatron Engn & Automat, 20 Chengzhong Rd, Shanghai 201800, Peoples R China.
2.[2]Chalmers Univ Technol, Elect Mat & Syst Lab, Dept Microtechnol & Nanosci, Kemivagen 9, SE-41296 Gothenburg, Sweden.
3.[3]SIAGAT, Shenzhen 518106, Peoples R China.
4.[4]Shanghai Univ, SMIT Ctr, Sch Mechatron Engn & Automat, 20 Chengzhong Rd, Shanghai 201800, Peoples R China.
5.[5]Shanghai Shang Da Ruihu Microsyst Integrat Techno, Room 203,Bldg 2,1919,Fengxiang Rd, Shanghai 200444, Peoples R China.
6.[6]SHT Smart High Tech AB, Hugo Grauers Gatan 3A, SE-41133 Gothenburg, Sweden.
7.[7]Shanghai Univ, SMIT Ctr, Sch Mechatron Engn & Automat, 20 Chengzhong Rd, Shanghai 201800, Peoples R China.
8.Chalmers Univ Technol, Elect Mat & Syst Lab, Dept Microtechnol & Nanosci, Kemivagen 9, SE-41296 Gothenburg, Sweden.
推荐引用方式
GB/T 7714
Chen, Shujing[1],Zehri, Abdelhafid[2],Wang, Qianlong[3],et al. Manufacturing Graphene-Encapsulated Copper Particles by Chemical Vapor Deposition in a Cold Wall Reactor[J]. CHEMISTRYOPEN,2019,8:58-63.
APA Chen, Shujing[1].,Zehri, Abdelhafid[2].,Wang, Qianlong[3].,Yuan, Guangjie[4].,Liu, Xiaohua[5].,...&Liu, Johan[7].(2019).Manufacturing Graphene-Encapsulated Copper Particles by Chemical Vapor Deposition in a Cold Wall Reactor.CHEMISTRYOPEN,8,58-63.
MLA Chen, Shujing[1],et al."Manufacturing Graphene-Encapsulated Copper Particles by Chemical Vapor Deposition in a Cold Wall Reactor".CHEMISTRYOPEN 8(2019):58-63.
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