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Oxygen incorporation in wide band gap semiconductor ZnSe thin films
Can Wen; Zhe Zhu; Wei Li; Jingquan Zhang; Lili Wu; Bing Li; Guanggen Zeng; Wenwu Wang
刊名Journal of Alloys and Compounds
2017
卷号Vol.718页码:197-203
关键词Oxygen incorporation ZnSe thin films II–VI chalcogenide series
ISSN号0925-8388
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/1995997
专题四川大学
作者单位College of Materials Science and Engineering, Sichuan University, Chengdu, 610064, China
推荐引用方式
GB/T 7714
Can Wen,Zhe Zhu,Wei Li,et al. Oxygen incorporation in wide band gap semiconductor ZnSe thin films[J]. Journal of Alloys and Compounds,2017,Vol.718:197-203.
APA Can Wen.,Zhe Zhu.,Wei Li.,Jingquan Zhang.,Lili Wu.,...&Wenwu Wang.(2017).Oxygen incorporation in wide band gap semiconductor ZnSe thin films.Journal of Alloys and Compounds,Vol.718,197-203.
MLA Can Wen,et al."Oxygen incorporation in wide band gap semiconductor ZnSe thin films".Journal of Alloys and Compounds Vol.718(2017):197-203.
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