Effect of parent internal excitation on product state distribution in methyl radical photodissociation at 212.5 nm

	Effect of parent internal excitation on product state distribution in methyl radical photodissociation at 212.5 nm
	Wu, Guo-Rong ; Zhang, Jing-Hui ; Harich, Steven A.; Yang, Xue-ming
刊名	chinese journal of chemical physics
	2006-04-27
卷号	19 期号:2 页码:109-116
关键词	high Rydberg state CH3 radical photodissociation
通讯作者	杨学明
产权排序	1;1
英文摘要	photodissociation dynamics of the ch3 radical at 212.5 nm excitation has been studied experimentally using the h atom rydberg tagging time-of-flight method. ch3 radicals are produded by photodissociation of gh(3)i at 266 run. translational energy distribution and angular distribution for the ch2 product from ch3 photodissociation at different vibrational levels via the 3s rydberg state have been measured. from these distributions, product j state distributions are obtained for photodissociation of different vibrationally excited ch3 radicals. the effect of parent vibrational as well as rotational excitation on the dissociation dynamics of ch3 is also investigated in detail. experimental results in this work show that parent vibrational excitation in the umbrella mode has a significant effect on both rotational excitation and angular distribution of the ch2 product, while parent rotational excitation has obvious effect only on the angular distribution of ch2 product.
WOS标题词	science & technology ; physical sciences
类目[WOS]	physics, atomic, molecular & chemical
研究领域[WOS]	physics
关键词[WOS]	potential-energy surfaces ; multi-photon ionization ; dynamics ; spectroscopy ; iodide ; band ; ch3 ; molecules ; cd3
收录类别	SCI
原文出处	true
语种	英语
WOS记录号	WOS:000237684100005
公开日期	2010-11-30
内容类型	期刊论文
源URL	[http://159.226.238.44/handle/321008/97177]
专题	大连化学物理研究所_中国科学院大连化学物理研究所
作者单位	1.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Mol React Dynam, Dalian 116023, Peoples R China 2.Acad Sinica, Inst Atom & Mol Sci, Taipei 23166, Taiwan
推荐引用方式 GB/T 7714	Wu, Guo-Rong,Zhang, Jing-Hui,Harich, Steven A.,et al. Effect of parent internal excitation on product state distribution in methyl radical photodissociation at 212.5 nm[J]. chinese journal of chemical physics,2006,19(2):109-116.
APA	Wu, Guo-Rong,Zhang, Jing-Hui,Harich, Steven A.,&Yang, Xue-ming.(2006).Effect of parent internal excitation on product state distribution in methyl radical photodissociation at 212.5 nm.chinese journal of chemical physics,19(2),109-116.
MLA	Wu, Guo-Rong,et al."Effect of parent internal excitation on product state distribution in methyl radical photodissociation at 212.5 nm".chinese journal of chemical physics 19.2(2006):109-116.