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题名	调平聚焦伺服控制系统的优化设计
作者	宗永红
文献子类	硕士
导师	周常河
关键词	光栅 grating 调平调焦 leveling and focusing 差动像散 differential astigmatism 反馈控制 feedback control 误差分析与校正 error analysis and correction
其他题名	Optimal Design of Leveling and Focusing Servo Control System
英文摘要	光栅作为衍射光学的关键元件，凭借其优异的色散、分束等特性被广泛应用于军事、天文探测以及工业科研等多个领域，随着微纳技术的不断发展，对光栅的要求越来越高，比如：光栅的尺寸要求越来越大，密度和精度越来越高，这就对光栅的制备技术提出了更高的要求。激光直写技术，作为一种无掩膜光刻技术，以其低成本、低环境要求、高加工效率等优势，在众多无掩膜光刻技术中脱颖而出，成为了国内外众多研究机构及公司研究的热点。近些年该技术越来越多的被应用于微纳光学器件等领域。 为了使激光直写方式相对于其它的光刻方式更具有竞争力，并提高激光直写系统制备光栅的效率，发达国家提出了激光并行直写的概念，但目前国内的光栅制备水平与国外发达国家还有很大的差距。为了使可见光波段的激光直写光刻技术应用到纳米光学制造领域，并形成核心技术的自主知识产权，为中国的微纳光学元件加工领域提供一种低成本、高性能的技术手段，本实验室在传统的激光并行直写的基础上，开发了一套面向大尺寸、高密度光栅制备的基于达曼光栅的多光束激光并行直写装置，该激光并行直写装置主要由激光调制模块、聚焦伺服模块以及样品扫描模块三个部分组成，本论文在实验室已经搭建的基于达曼光栅的多光束激光并行直写系统的基础上，为了适应更大尺寸、更高精度光栅制备的需要，进一步改进了系统，主要包含了以下几个方面的研究工作： a) 阐述了光栅制作技术的发展，具体阐述了全息光栅制作技术、国内外激光直写技术的特点，并分析对比了它们的性能指标，引出了本实验室原有的基于达曼光栅的激光并行直写技术的重大意义。对现有的基于达曼光栅激光并行直写系统进行了简要分析，分析了作为影响刻写质量的核心单元—自动聚焦检测技术的发展，提出了激光并行直写装置现存的问题。以提高光栅刻写质量为目标，对原系统的自动聚焦模块进行了详细分析，详细介绍了自动聚焦模块中的离焦像散检测原理、利用Matlab软件设计建模的过程及结果，通过对比结果，确定了由原系统中的单个像散检测方法改为差动像散检测方法，为提高聚焦效率，在自动聚焦的基础上，额外加入调平模块，调平模块和自动聚焦模块统称为调平聚焦伺服控制系统，然后对调平聚焦系统光路原理进行了详细分析与展示。 b) 在对优化后的调平聚焦光路进行详细分析及确定光路参数之后，对系统的整体软硬件控制架构进行了详细阐述。硬件方面，确定了系统光学元器件的型号及它们之间的通讯接口连接方式，确定了以计算机为核心的仪器结构。软件方面，根据对系统实时性的要求，确定Labview虚拟仪器软件作为开发软件，从系统的反馈方式、反馈控制算法、软件设计思想、流程以及具体程序框图等多个方面对软件编程进行了详细说明。之后，详细讨论了光学参数的影响、环境振动的影响与消除方式、移动平台组合方式及误差测试与补偿等内容。采取一些误差补偿及消除措施后，优化后的调平自动聚焦模块成为一个能集成于现有基于达曼光栅的激光并行直写系统的实验平台。 c) 对优化后的调平聚焦伺服控制系统进行实验性能的验证。实验方面，从优化后系统的动态、静态以及与原自动聚焦模块对比这三个角度对系统的实验结果进行了详细分析，得出优化后的调平聚焦伺服控制系统的性能的优势。之后将调平自动聚焦模块集成于激光并行直写系统中，利用该系统，进行了不同周期、不同尺寸、不同占空比以及不同面型的光栅掩膜版的刻写。刻写结果进一步证明了优化后的系统进一步提高了光栅刻写质量，达到了预期设计期望，进一步为更大尺寸、更高密度光栅刻写提供了依据。 本硕士论文对实验室现有的基于达曼光栅的激光并行直写系统的子系统模块进行了优化改善，将原有的自动聚焦模块优化为调平聚焦伺服控制系统，建立了完整的模型，阐述了系统的硬件和软件控制，分析并校正了刻写系统中的主要误差，同时为了验证优化后的系统的可行性，从系统多个方面对实验结果进行了分析对比，证明了优化后的调平聚焦伺服控制系统进一步提高了聚焦精度，将优化后的调平聚焦伺服控制系统集成到激光并行直写系统中，利用该激光并行直写系统，刻写出了比利用集成了原自动聚焦模块的激光直写系统更高质量的光栅掩膜版。; As a key element of diffraction optics, grating is widely applied in many fields such as military, astronomical exploration and industrial research because of its excellent dispersive, splitting and other characteristics. With the rapid development of micro-nano technology, the requirements of grating become higher. For example, the size of grating is increasing, and the density and accuracy are getting higher, which have higher commands on the grating fabrication techniques. The Direct Laser Writing (DLW) technique stands out from the maskless lithography techniques with the advantages of low cost, low requirements of environment and high efficiency, the DLW technique has become a hotspot in the study of many domestic and foreign research institutions and companies. In recent years, it is increasingly being used in micro-nano optics manufacturing and other fields. In order to make the DLW technique more competitive than other lithography techniques and improve the efficiency of the grating fabrication technique, the developed countries had proposed the concept of the parallel direct laser writing technique which develops quickly. However, the domestic fabrication technique of grating is far behind the developed countries. In order to fabricate diffraction gratings with different sizes, different types and supply low cost, high performance system for Chinese lithography industry, our laboratory have proposed a parallel direct laser writing technique based on Dammann grating for large size and high density grating fabrication, this parallel direct laser writing device is mainly composed of three modules: the writing optical path module, the servo focus module and the sample scanning module. In order to meet the needs of large-size and high-precision grating fabrication and improve the performance of the original parallel direct laser writing system based on Dammann grating, this dissertation mainly works on the following aspects: a) The development of the grating fabrication techniques, specifically the characteristics of holographic grating fabrication technique and the DLW technique are expatiated, the performance of these techniques are discussed in detail, the great significance of the parallel direct laser writing system based on Dammann grating is given. A brief analysis of the parallel direct laser writing system based on Dammann grating is presented, the development of the auto-focus detection technique which affects the quality of grating is analyzed, the existing problems of the parallel direct laser writing device are proposed. With the purpose of improving the quality of the grating, the servo focus module of the system is analyzed detailedly. Principle of the astigmatic method for focusing, together with the modeling design procedures and results designed by Matlab are discussed adequately. Comparing the results, the differential astigmatic detection method is selected, the leveling module is added on the basis of the servo focus module, these two modules form a small system which is called the leveling and focusing servo control system. The principle of the leveling and focusing servo control system is analyzed and displayed respectively. b) After the detailed analysis of the optimized leveling and focusing servo control system, the hardware structure and software architecture of the system are described in detail. In terms of the hardware structure, the computer is the core, and the optical components, together with their communication are determined. Then the software architecture is discussed, according to the requirement of real-time, the virtual instrument software –Labview is used in this system, the software programming is described from the aspects of the feedback mode, the feedback control algorithm, the software design processes and the program diagrams. Then, the influence to the system of the optical parameters, the influence to the writing system and elimination method of the environmental vibration, combination ways of translation stages, error measurement and pre-compensation of the stages are analyzed in details. After taking these error compensation and elimination measures, the optimized leveling and focusing servo control model becomes an experimental module that can be integrated into the existing parallel direct laser write system based on the Dammann grating. c) The experimental performance of the optimized leveling and focusing servo control system is displayed. In the experimental aspect, the experimental results of the system are analyzed from three aspects: the dynamic, the static and the original system, then the advantages of the optimized leveling and focusing system are obtained. Then, the leveling and focusing servo control module is integrated into the parallel direct laser writing system, the system is used to fabricate gratings with different periods, different sizes, different duty cycles and different types. The quality of the grating confirms that the optimized leveling and focusing servo control system further improves the writing quality of the grating, achieves the expected design and provides the basis for the larger size and higher density grating fabrication. In this dissertation, the performance of the original parallel direct laser writing system based on Dammann grating has been improved. The original servo focus module is optimized as the leveling and focusing servo control system. The control process of the system is expounded from the aspects of hardware structure and software architecture, and the main errors in the leveling and focusing servo control system are analyzed and corrected. Then, in order to verify the feasibility of the optimized leveling and focusing servo control system, the experimental results of the system are analyzed from several aspects. It is proved that the optimized leveling and focusing servo control system further improves the accuracy, and the grating fabricated by the writing system with the optimized leveling and focusing servo control system has higher quality than which fabricated by the original writing system with the servo focus module.
学科主题	光学工程
内容类型	学位论文
源URL	[http://ir.siom.ac.cn/handle/181231/30935]
专题	中国科学院上海光学精密机械研究所
作者单位	中国科学院上海光学精密机械研究所
推荐引用方式 GB/T 7714	宗永红. 调平聚焦伺服控制系统的优化设计[D].

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