Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography
Xue, C. F.; J. Zhao; Y. Q. Wu; H. N. Yu; S. M. Yang; L. S. Wang; W. C. Zhao; Q. Wu; Z. C. Zhu; B. Liu
刊名Applied Surface Science
2017
卷号425
英文摘要Periodic nanostructures have attracted considerable interest and been applied in many fields. However, nanostructures of sufficiently large areas and depths are necessary for the development of practical devices. In this study, large-area high-aspect-ratio periodic nanostructures were fabricated by using a hybrid technology based on X-ray interference lithography, and then the patterns were transferred onto various substrates successfully. The final periodic nanostructures on the substrate attained measurements up to square centimetres with depths greater than 200 nm. (C) 2017 Elsevier B.V. All rights reserved.
语种英语
内容类型期刊论文
源URL[http://ir.ciomp.ac.cn/handle/181722/59361]  
专题长春光学精密机械与物理研究所_中科院长春光机所知识产出
推荐引用方式
GB/T 7714
Xue, C. F.,J. Zhao,Y. Q. Wu,et al. Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography[J]. Applied Surface Science,2017,425.
APA Xue, C. F..,J. Zhao.,Y. Q. Wu.,H. N. Yu.,S. M. Yang.,...&W. C. Zhou and R. Z. Tai.(2017).Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography.Applied Surface Science,425.
MLA Xue, C. F.,et al."Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography".Applied Surface Science 425(2017).
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