Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography

doi:10.1016/j.mee.2016.12.028

CORC > 上海应用物理研究所 > 中国科学院上海应用物理研究所 > 中科院上海应用物理研究所2011-2017年

	Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography
	Zhao, J; Wu, YQ; Xue, CF; Yang, SM; Wang, LS; Zhu, FY; Zhu, ZC; Liu, B; Wang, Y; Tai, RZ
刊名	MICROELECTRONIC ENGINEERING
	2017
卷号	170 页码:49-53
关键词	Periodic Structures Scintillator Soft X-ray Interference Lithography High Aspect Ratio
ISSN号	0167-9317
DOI	10.1016/j.mee.2016.12.028
文献子类	期刊论文
英文摘要	Nanoscale periodic structures have been utilized in the scintillator field to obtain enhanced light extraction efficiency. Sufficient structure depth is necessary to achieve better extraction efficiency. Recently, a soft X-ray interference lithography (SXIL) has been developed in the Shanghai Synchrotron Radiation Facility (SSRF). SXIL can be used to fabricate a high aspect ratio pattern due to the uniform distribution Of the beam dose at the photoresist depth. A grating mask with a new photon stop layer was attempted, mainly Consisting of Perm alloy, and it was optimized for the SXIL to increase the entire service life. Preliminary results suggest that PMMA structure with an aspect ratio of up to 3 has been successfully manufactured using SXIL techniques. Therefore, this technique has been studied to fabricate the artificial nanostructure on the scintillator in the high efficiency radiation detector area. (C) 2016 Elsevier B.V. All rights reserved.
语种	英语
WOS记录号	WOS:000393936400009
内容类型	期刊论文
源URL	[http://ir.sinap.ac.cn/handle/331007/27322]
专题	上海应用物理研究所_中科院上海应用物理研究所2011-2017年
推荐引用方式 GB/T 7714	Zhao, J,Wu, YQ,Xue, CF,et al. Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography[J]. MICROELECTRONIC ENGINEERING,2017,170:49-53.
APA	Zhao, J.,Wu, YQ.,Xue, CF.,Yang, SM.,Wang, LS.,...&Tai, RZ.(2017).Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography.MICROELECTRONIC ENGINEERING,170,49-53.
MLA	Zhao, J,et al."Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography".MICROELECTRONIC ENGINEERING 170(2017):49-53.