ECR Plasma Cleaning: An In-situ Processing Technique for RF Cavities

	ECR Plasma Cleaning: An In-situ Processing Technique for RF Cavities
	G.Wu; H.Jiang; T.Khabiboulline; I.Pechenezhskiy; T.Koeth; J.Reid; W.Muranyi; B.Tennis; E.Harms; Y.Terechkine
	2007
会议日期	2007
会议地点	China
会议录	Proceedings of the 13th International Conference on RF Superconductivity
内容类型	会议论文
源URL	[http://ir.ihep.ac.cn/handle/311005/259481]
专题	学术会议_国际参会_JaCoW高能所参会会议_SRF
作者单位	Fermilab
推荐引用方式 GB/T 7714	G.Wu,H.Jiang,T.Khabiboulline,et al. ECR Plasma Cleaning: An In-situ Processing Technique for RF Cavities[C]. 见:. China. 2007.