Entanglement Concentration with Different Measurement in a 3-Mode Optomechanical System
Li, Z (reprint author), Chinese Acad Sci, Inst Theoret Phys, CAS Key Lab Theoret Phys, Beijing 100190, Peoples R China.; Li, Z; Li, Z (reprint author), Univ Chinese Acad Sci, Sch Phys, POB 4588, Beijing 100049, Peoples R China.
刊名COMMUNICATIONS IN THEORETICAL PHYSICS
2017
卷号68期号:1页码:57-63
关键词Entanglement Concentration Quantum Measurement Optomechanical System
DOIhttp://dx.doi.org/10.1088/0253-6102/68/1/57
英文摘要In this work, we perform a series of phonon counting measurement with different methods in a 3-mode optomechanical system, and we compare the difference of the entanglement after measurement. In this article we focus on the three cases: prefect measurement, imperfect measurement and on-off measurement. We find that whatever measurement you take, the entanglement will increase. The size of entanglement enhancement is the largest in the perfect measurement, second in the imperfect measurement, and it is not obvious in the on-off measurement. We are sure that the more precise measurement information, the larger entanglement concentration.
学科主题Physics
语种英语
内容类型期刊论文
源URL[http://ir.itp.ac.cn/handle/311006/22021]  
专题理论物理研究所_理论物理所1978-2010年知识产出
通讯作者Li, Z (reprint author), Chinese Acad Sci, Inst Theoret Phys, CAS Key Lab Theoret Phys, Beijing 100190, Peoples R China.; Li, Z (reprint author), Univ Chinese Acad Sci, Sch Phys, POB 4588, Beijing 100049, Peoples R China.
推荐引用方式
GB/T 7714
Li, Z ,Li, Z,Li, Z . Entanglement Concentration with Different Measurement in a 3-Mode Optomechanical System[J]. COMMUNICATIONS IN THEORETICAL PHYSICS,2017,68(1):57-63.
APA Li, Z ,Li, Z,&Li, Z .(2017).Entanglement Concentration with Different Measurement in a 3-Mode Optomechanical System.COMMUNICATIONS IN THEORETICAL PHYSICS,68(1),57-63.
MLA Li, Z ,et al."Entanglement Concentration with Different Measurement in a 3-Mode Optomechanical System".COMMUNICATIONS IN THEORETICAL PHYSICS 68.1(2017):57-63.
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