Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films | |
Gao FY(高方圆); Li G(李光); Xia Y(夏原); Xia, Y (reprint author), Chinese Acad Sci, Inst Mech, 15 Beisihuanxi Rd, Beijing 100190, Peoples R China. | |
2018 | |
会议日期 | NOV 12-14, 2016 |
会议地点 | Hangzhou, PEOPLES R CHINA |
关键词 | Thin-films Mechanical-properties Coatings Microstructure Oxidation Evolution Al Si |
页码 | 160-164 |
英文摘要 | This article reports on the hysteresis effect in TiAlSiN films prepared by an intermediate frequency magnetron. The discharge voltages for different metallic alloy targets varying with nitrogen flow rate were systematically investigated, under a constant pressure provided by sputtering gas. The hysteresis transition was introduced by the sudden changes in sputtering rate, fraction of compound formation, phase composition and mechanical properties. The result was shown that: the initial growth rate aD in metallic mode was 4 times faster than that in supersaturated state. The optimized stoichiometric TiAl(Si)N-x=1 films containing 50 at.% N were founded in the transition region. The discussion on the plasma characteristics caused by hysteresis process showed that the TiN(111) texture could be increased by applying higher particle bombarding energy. The hardness of TiAlSiN film was strongly influenced by the orientation, which depended on the loading history of nitrogen. The superior TiAlSiN film with hardness 33 GPa could be prepared during the nitrogen unloading for same nitrogen flow rates. (C) 2017 Elsevier B.V. All rights reserved. |
会议录 | APPLIED SURFACE SCIENCE |
资助机构 | This work is financially supported by the International Science & Technology Cooperation Program of China (No.2014DFG51240) and the Strategic Priority Research Program of the Chinese Academy of Sciences (No.XDB22040503). |
会议录出版者 | ELSEVIER SCIENCE BV |
会议录出版地 | AMSTERDAM |
语种 | 英语 |
WOS记录号 | WOS:000416964200022 |
内容类型 | 会议论文 |
源URL | [http://dspace.imech.ac.cn/handle/311007/72161] |
专题 | 力学研究所_先进制造工艺力学重点实验室 |
通讯作者 | Xia, Y (reprint author), Chinese Acad Sci, Inst Mech, 15 Beisihuanxi Rd, Beijing 100190, Peoples R China. |
作者单位 | 1.[Gao, Fangyuan 2.Li, Guang 3.Xia, Yuan] Chinese Acad Sci, Inst Mech, 15 Beisihuanxi Rd, Beijing 100190, Peoples R China 4.[Gao, Fangyuan 5.Li, Guang 6.Xia, Yuan] Univ Chinese Acad Sci, Beijing 100049, Peoples R China |
推荐引用方式 GB/T 7714 | Gao FY,Li G,Xia Y,et al. Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films[C]. 见:. Hangzhou, PEOPLES R CHINA. NOV 12-14, 2016. |
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