Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 信息光学与光电技术实验室

	Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image
	Zhu, Boer; Wang, Xiangzhao; Li, Sikun; Yan, Guanyong; Shen, Lina; Duan, Lifeng
刊名	Appl. Optics
	2016
卷号	55 期号:12 页码:3192
通讯作者	wxz26267@siom.ac.cn
英文摘要	A wavefront aberration measurement method for a hyper-NA lithographic projection lens by use of an aerial image based on principal component analysis is proposed. Aerial images of the hyper-NA lithographic projection lens are expressed accurately by using polarized light and a vector imaging model, as well as by considering the polarization properties. As a result, the wavefront aberrations of the hyper-NA lithographic projection lens are measured accurately. The lithographic simulator PROLITH is used to validate the accuracies of the wavefront aberration measurement and analyze the impact of the polarization rotation of illumination on the accuracy of the wavefront aberration measurement, as well as the degree of polarized light and the sample interval of aerial images. The result shows that the proposed method can retrieve 33 terms of Zernike coefficients (Z(5) - Z(37)) with a maximum error of less than 0.00085 lambda. (C) 2016 Optical Society of America
收录类别	SCI
资助信息	National Natural Science Foundation of China (NSFC) [61205102, 61275207, 61405210, 61474129]
WOS记录号	WOS:000374388600043
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/27546]
专题	上海光学精密机械研究所_信息光学与光电技术实验室
作者单位	中国科学院上海光学精密机械研究所
推荐引用方式 GB/T 7714	Zhu, Boer,Wang, Xiangzhao,Li, Sikun,et al. Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image[J]. Appl. Optics,2016,55(12):3192.
APA	Zhu, Boer,Wang, Xiangzhao,Li, Sikun,Yan, Guanyong,Shen, Lina,&Duan, Lifeng.(2016).Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image.Appl. Optics,55(12),3192.
MLA	Zhu, Boer,et al."Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image".Appl. Optics 55.12(2016):3192.