XPS spectra of cu thin films prepared by ionized cluster beam deposition

	XPS spectra of cu thin films prepared by ionized cluster beam deposition
	Cao, Bo; Yang, Tongrui; Li, Gongping; Cho, Seongjin; Kim, Hee
	2012
会议名称	2nd International Symposium on Chemical Engineering and Material Properties, ISCEMP 2012
会议日期	June 22, 2012 - June 24, 2012
会议地点	Taiyuan, Shanxi, China
关键词	X ray photoelectron spectroscopy Atoms Binding energy Chemical engineering Chemical modification Deposits Ions Photoelectrons Silicon Surface properties Thin films Vapor deposition Atomic binding Bulk materials Copper films Cu thin film Ionized cluster beam deposition Ionized cluster beams Local energy Neutral clusters P-type Si XPS spectra
卷号	549
页码	720-723
通讯作者	Cao, B. (caobo@ncepu.edu.cn)
会议录	Advanced Materials Research
会议录出版地	Clausthal-Zellerfeld
学科主题	Atomic and Molecular Physics;Chemical Engineering;Chemical Reactions;Physical Chemistry; Materials Science; Engines; Metallurgical Furnaces
语种	英语
ISSN号	1022-6680
内容类型	会议论文
源URL	[http://ir.lzu.edu.cn/handle/262010/184915]
专题	核科学与技术学院_会议论文
推荐引用方式 GB/T 7714	Cao, Bo,Yang, Tongrui,Li, Gongping,et al. XPS spectra of cu thin films prepared by ionized cluster beam deposition[C]. 见:2nd International Symposium on Chemical Engineering and Material Properties, ISCEMP 2012. Taiyuan, Shanxi, China. June 22, 2012 - June 24, 2012.