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Simulation study of conductive filament growth dynamics in oxide-electrolyte-based ReRAM
Sun PX(孙鹏霄); Liu S(刘肃); Li L(李泠); Liu M(刘明)
刊名Journal of Semiconductors
2014-10-15
卷号35期号:10页码:60-63
关键词ReRAM Monte Carlo method growth direction of filament ion migration rate
ISSN号16744926
其他题名Simulation study of conductive filament growth dynamics in oxide-electrolyte-based ReRAM
通讯作者Liu, Su
学科主题Mathematical Statistics
语种英语
内容类型期刊论文
源URL[http://202.201.7.4/handle/262010/107728]  
专题物理科学与技术学院_期刊论文
推荐引用方式
GB/T 7714
Sun PX,Liu S,Li L,et al. Simulation study of conductive filament growth dynamics in oxide-electrolyte-based ReRAM[J]. Journal of Semiconductors,2014,35(10):60-63.
APA 孙鹏霄,刘肃,李泠,&刘明.(2014).Simulation study of conductive filament growth dynamics in oxide-electrolyte-based ReRAM.Journal of Semiconductors,35(10),60-63.
MLA 孙鹏霄,et al."Simulation study of conductive filament growth dynamics in oxide-electrolyte-based ReRAM".Journal of Semiconductors 35.10(2014):60-63.
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