Simulation study of conductive filament growth dynamics in oxide-electrolyte-based ReRAM | |
Sun PX(孙鹏霄); Liu S(刘肃); Li L(李泠); Liu M(刘明) | |
刊名 | Journal of Semiconductors |
2014-10-15 | |
卷号 | 35期号:10页码:60-63 |
关键词 | ReRAM Monte Carlo method growth direction of filament ion migration rate |
ISSN号 | 16744926 |
其他题名 | Simulation study of conductive filament growth dynamics in oxide-electrolyte-based ReRAM |
通讯作者 | Liu, Su |
学科主题 | Mathematical Statistics |
语种 | 英语 |
内容类型 | 期刊论文 |
源URL | [http://202.201.7.4/handle/262010/107728] |
专题 | 物理科学与技术学院_期刊论文 |
推荐引用方式 GB/T 7714 | Sun PX,Liu S,Li L,et al. Simulation study of conductive filament growth dynamics in oxide-electrolyte-based ReRAM[J]. Journal of Semiconductors,2014,35(10):60-63. |
APA | 孙鹏霄,刘肃,李泠,&刘明.(2014).Simulation study of conductive filament growth dynamics in oxide-electrolyte-based ReRAM.Journal of Semiconductors,35(10),60-63. |
MLA | 孙鹏霄,et al."Simulation study of conductive filament growth dynamics in oxide-electrolyte-based ReRAM".Journal of Semiconductors 35.10(2014):60-63. |
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