The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition

	The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition
刊名	APPLIED PHYSICS LETTERS
	2008-09-29
卷号	93 期号:13 页码:-
ISSN号	0003-6951
通讯作者	Zhang, JY (reprint author), Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China.
学科主题	Physics
语种	英语
WOS记录号	WOS:000259794100040
内容类型	期刊论文
源URL	[http://202.201.7.4/handle/262010/104565]
专题	物理科学与技术学院_期刊论文
推荐引用方式 GB/T 7714	. The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition[J]. APPLIED PHYSICS LETTERS,2008,93(13):-.
APA	(2008).The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition.APPLIED PHYSICS LETTERS,93(13),-.
MLA	"The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition".APPLIED PHYSICS LETTERS 93.13(2008):-.