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CFD simulation of the fused silica synthesis furnace
Feng, Tao ; Wang, Peiyong ; Wang PY(王培勇)
2013
关键词Atmospheric temperature Chemical vapor deposition Fused silica Innovation Refractive index Surface properties
英文摘要Conference Name:2nd International Conference on Engineering and Technology Innovation 2012, ICETI 2012. Conference Address: Kaohsiung, Taiwan. Time:November 2, 2012 - November 6, 2012.; AandF; Tailift Co., Ltd; SPINTECH; Smart Motion Control Co.,Ltd.; FXB Flexible Motion; et al; The synthesis process of the fused silica glass uses chemical vapor deposition (CVD) method in a furnace. The synthesis process involves complicated physical-chemical phenomena such as turbulence, combustion, radiation, two-phase flow, and so on. A CFD simulation has been carried out for an industrial furnace and process. The simulation result including temperature and major species concentration then is input to CHEMKIN to calculate the radical equilibrium concentration on the fused silica surface. The trend of the simulated fused silica surface temperature is consistent with the measured refraction index showing that the surface temperature is one of the most important parameters influencing the refractive index uniformity of the fused silica product. ? (2013) Trans Tech Publications, Switzerland.
语种英语
出处http://dx.doi.org/10.4028/www.scientific.net/AMM.284-287.51
出版者Trans Tech Publications
内容类型其他
源URL[http://dspace.xmu.edu.cn/handle/2288/86109]  
专题物理技术-会议论文
推荐引用方式
GB/T 7714
Feng, Tao,Wang, Peiyong,Wang PY. CFD simulation of the fused silica synthesis furnace. 2013-01-01.
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