Morphological Stability of Epitaxial Thin Elastic Films by Van Der Waals Force
Zhao YP(赵亚溥)
刊名Archive of Applied Mechanics
2002
卷号72期号:1页码:77-84
ISSN号0939-1533
通讯作者Zhao, YP (reprint author), Chinese Acad Sci, Inst Mech, State Key Lab Nonlinear Mech, Beijing 100080, Peoples R China.
英文摘要The morphological stability of epitaxial thin elastic films on a substrate by van der Waals force is discussed. It is found that only van der Waals force with negative Hamaker constant (A < 0) tends to stabilize the film, and the lower bound for the Hamaker constant is also obtained for the stability of thin film. The critical value of the undulation wavelength is found to be a function of both film thickness and external stress. The charateristic time-scale for surface mass diffusion scales to the fourth power to the wavelength of the perturbation.
学科主题力学
类目[WOS]Mechanics
研究领域[WOS]Mechanics
收录类别SCI ; EI
语种英语
WOS记录号WOS:000173782600005
公开日期2007-06-15 ; 2007-12-05 ; 2009-06-23
内容类型期刊论文
源URL[http://dspace.imech.ac.cn/handle/311007/16779]  
专题力学研究所_力学所知识产出(1956-2008)
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Zhao YP. Morphological Stability of Epitaxial Thin Elastic Films by Van Der Waals Force[J]. Archive of Applied Mechanics,2002,72(1):77-84.
APA 赵亚溥.(2002).Morphological Stability of Epitaxial Thin Elastic Films by Van Der Waals Force.Archive of Applied Mechanics,72(1),77-84.
MLA 赵亚溥."Morphological Stability of Epitaxial Thin Elastic Films by Van Der Waals Force".Archive of Applied Mechanics 72.1(2002):77-84.
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