| 水溶液中Co-Sb薄膜的电化学沉积; Electrodeposition of Co-Sb Thin Films in Aqueous Solution | |
| 彭志勇 ; 潘元春 ; 萨百晟 ; 周健 | |
| 2013-09-28 | |
| 关键词 | 电化学沉积 薄膜 水溶液 热处理 electrodeposition films aqueous solution heat treatment |
| 英文摘要 | 采用电化学循环伏安法分析了柠檬酸水溶液中CO2+、SbO+的沉积电位,利用恒电位沉积的方法,在不锈钢基片上,从柠檬酸水溶液中沉积出CO-Sb薄膜.运用X射线衍射和扫描电子显微镜对薄膜的结构、组成以及形貌进行了分析.结果表明,在柠檬酸水溶液中,CO2+和SbO+可同时沉积到不锈钢基片上,形成CO-Sb薄膜,在不同的沉积电位下,薄膜形成不同的物相.薄膜的形貌呈现颗粒状,分布比较均匀.薄膜在充满Ar的管式炉中热处理2H,热处理温度为400℃,结果发现薄膜物相组成发生了很大变化,转变为主要由晶体COSb3组成,还有少量的COSb形成.; Co-Sb films were synthesized on the stainless steel electrode by electrochemical deposition in aqueous solution.Growth behavior of Co-Sb films was studied with cyclic voltammetry and potentiostatic method.The microstructure,composition and morphology of the films were studied by X-ray diffraction,scanning electron microscopy and electron probe microanalysis.Effects of deposition potentials and heat treatment on the microstructure,chemical component,phase composition of the deposited films were also studied and discussed in detail.It turns out that cobalt and antimony can be deposited on the steel substrate together,forming Co-Sb films.The films were composed of crystalline antimony and non-crystal cobalt.After heat treatment of 400 ℃in tube furnace,the films mainly consisted of cobalt triantimonide with less cobalt monoantimonide.; 中央高校基本科研业务费专项资金(2010121054;201112G016) |
| 语种 | zh_CN |
| 内容类型 | 期刊论文 |
| 源URL | [http://dspace.xmu.edu.cn/handle/2288/98431]  |
| 专题 | 材料学院－已发表论文 |
| 推荐引用方式 GB/T 7714 | 彭志勇,潘元春,萨百晟,等. 水溶液中Co-Sb薄膜的电化学沉积, Electrodeposition of Co-Sb Thin Films in Aqueous Solution[J],2013. |
| APA | 彭志勇,潘元春,萨百晟,&周健.(2013).水溶液中Co-Sb薄膜的电化学沉积.. |
| MLA | 彭志勇,et al."水溶液中Co-Sb薄膜的电化学沉积".(2013). |
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