Room-temperature deposition of transparent conducting Al-doped ZnO films by RF magnetron sputtering method

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	Room-temperature deposition of transparent conducting Al-doped ZnO films by RF magnetron sputtering method
	Yang, W. F. ; Liu, Z. G. ; Peng, D. L. ; Zhang, F. ; Huang, H. L. ; Xie, Y. N. ; Wu, Z. Y. ; Peng DL(彭栋梁)
刊名	http://dx.doi.org/10.1016/j.apsusc.2008.12.021
	2009-03-15
关键词	ZINC-OXIDE FILMS PULSED-LASER DEPOSITION THIN-FILMS OPTICAL-PROPERTIES SOLAR-CELLS PLASMA
英文摘要	Transparent conductive Al-doped zinc oxide (AZO) films with highly (0 0 2)-preferred orientation were deposited on quartz substrates at room temperature by RF magnetron sputtering. Optimization of deposition parameters was based on RF power, Ar pressure in the vacuum chamber, and distance between the target and substrate. The structural, electrical, and optical properties of the AZO thin films were investigated by X-ray diffraction, Hall measurement, and optical transmission spectroscopy. The 250 nm thickness AZO films with an electrical resistivity as low as 4.62 x 10(-4) Omega cm and an average optical transmission of 93.7% in the visible range were obtained at RF power of 300 W, Ar flow rate of 30 sccm, and target distance of 7 cm. The optical bandgap depends on the deposition condition, and was in the range of 3.75-3.86 eV. These results make the possibility for light emitting diodes (LEDs) and solar cells with AZO films as transparent electrodes, especially using lift-off process to achieve the transparent electrode pattern transfer. (C) 2008 Elsevier B.V. All rights reserved.
语种	英语
内容类型	期刊论文
源URL	[http://dspace.xmu.edu.cn/handle/2288/59453]
专题	材料学院－已发表论文
推荐引用方式 GB/T 7714	Yang, W. F.,Liu, Z. G.,Peng, D. L.,et al. Room-temperature deposition of transparent conducting Al-doped ZnO films by RF magnetron sputtering method[J]. http://dx.doi.org/10.1016/j.apsusc.2008.12.021,2009.
APA	Yang, W. F..,Liu, Z. G..,Peng, D. L..,Zhang, F..,Huang, H. L..,...&彭栋梁.(2009).Room-temperature deposition of transparent conducting Al-doped ZnO films by RF magnetron sputtering method.http://dx.doi.org/10.1016/j.apsusc.2008.12.021.
MLA	Yang, W. F.,et al."Room-temperature deposition of transparent conducting Al-doped ZnO films by RF magnetron sputtering method".http://dx.doi.org/10.1016/j.apsusc.2008.12.021 (2009).