High refractive index TiO2 film deposited by electron beam evaporation | |
Yao JK(姚建可) ; Huang H. L. ; Ma J. Y. ; Jin Y. X. ; Zhao Y. A. ; Shao J. D. ; He H. B. ; Yi K. ; Fan Z. X. ; Zhang F. ; Wu Z. Y. | |
刊名 | surf. eng. |
2009 | |
卷号 | 25期号:3页码:257 |
关键词 | Crystal seed Rutile TiO2 film High refractive index Electron beam evaporation |
ISSN号 | 0267-0844 |
中文摘要 | the well known 'crystal seed' theory is first applied in this work to prepare tio2 film: a high refractive index rutile tio2 film is grown by electron beam evaporation on the rutile seed formed by 1100 degrees c annealing. the average n is larger than 2.4, by far the highest in all the authors' tio2 films. the films are characterised by optical properties, microstructure and surface morphologies. it is found that the refractive index shows positive relation with the crystal structure, grain size, and packing density and roughness of the film. the film has lower density of granularity and nodule defects on the surface than those of the film deposited by magnetron sputtering. the result shows attractive application in complex filter and laser coatings. |
学科主题 | 光学薄膜 |
语种 | 英语 |
WOS记录号 | WOS:000264352500014 |
公开日期 | 2009-09-22 |
内容类型 | 期刊论文 |
源URL | [http://ir.siom.ac.cn/handle/181231/4784] |
专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
推荐引用方式 GB/T 7714 | Yao JK,Huang H. L.,Ma J. Y.,et al. High refractive index TiO2 film deposited by electron beam evaporation[J]. surf. eng.,2009,25(3):257, 260. |
APA | 姚建可.,Huang H. L..,Ma J. Y..,Jin Y. X..,Zhao Y. A..,...&Wu Z. Y..(2009).High refractive index TiO2 film deposited by electron beam evaporation.surf. eng.,25(3),257. |
MLA | 姚建可,et al."High refractive index TiO2 film deposited by electron beam evaporation".surf. eng. 25.3(2009):257. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论