Investigation on thermal stability of TiO2 films for application at high temperature

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 光学薄膜技术研究与发展中心

	Investigation on thermal stability of TiO2 films for application at high temperature
	Yao JK(姚建可) ; Huang H. L. ; Xu C. ; Ma J. Y. ; He H. B. ; Shao J. D. ; Jin Y. X. ; Zhao Y. A. ; Fan Z. X. ; Zhang F. ; Wu Z. Y.
刊名	surf. eng.
	2009
卷号	25 期号:2 页码:116
关键词	TiO2/SiO2 high reflectors High temperature thermal stability Scattering Absorption Refractive index Crack
ISSN号	0267-0844
中文摘要	the thermal stability of electron beam deposited tio2 monolayers and tio2/sio2 high reflectors (hr) during 300 to 1100 degrees c annealing is studied. it is found that the optical loss of film increases with the increase in annealing temperature, due to the phase change, crystallisation and deoxidising of film. scattering loss dominates the optical property degradation of film below 900 degrees c, while the absorption is another factor at 1100 degrees c. the increase in refractive index and decrease in physical thickness of tio2 layer shift the spectra of hr above 900 degrees c. the possible crack mechanism on the surface of hr during annealing is discussed. guidance for application on high temperature stable optical coatings is given.
学科主题	光学薄膜
语种	英语
WOS记录号	WOS:000264352300007
公开日期	2009-09-22
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/4782]
专题	上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式 GB/T 7714	Yao JK,Huang H. L.,Xu C.,et al. Investigation on thermal stability of TiO2 films for application at high temperature[J]. surf. eng.,2009,25(2):116, 119.
APA	姚建可.,Huang H. L..,Xu C..,Ma J. Y..,He H. B..,...&Wu Z. Y..(2009).Investigation on thermal stability of TiO2 films for application at high temperature.surf. eng.,25(2),116.
MLA	姚建可,et al."Investigation on thermal stability of TiO2 films for application at high temperature".surf. eng. 25.2(2009):116.