Al<inf>2</inf>O<inf>3</inf>/SiO<inf>2</inf> films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 光学薄膜技术研究与发展中心

	Al2O3/SiO2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC
	Zhang Feng ; Zhu Huili ; Yang Weifeng ; Wu Zhengyun ; Qi Hongji ; He HB(贺洪波) ; Fan ZX(范正修) ; Shao JD(邵建达)
刊名	appl. surf. sci.
	2008
卷号	254 期号:10 页码:3045
关键词	UV antireflection coatings 4H-SiC Al2O3/SiO2 films electron-beam evaporation
ISSN号	0169-4332
中文摘要	al2o3/sio2 films have been deposited as uv antireflection coatings on 4h-sic by electron-beam evaporation and characterized by reflection spectrum, scanning electron microscopy (sem) and x-ray photoelectron spectroscopy (xps). the reflectance of the al2o3/sio2 films is 0.33% and 10 times lower than that of a thermally grown sio2 single layer at 276 nm. the films are amorphous in microstructure and characterize good adhesion to 4h-sic substrate. xps results indicate an abrupt interface between evaporated sio2 and 4h-sic substrate free of si-suboxides. these results make the possibility for 4h-sic based high performance uv optoelectronic devices with al2o3/sio2 films as antireflection coatings. (c) 2007 elsevier b.v. all rights reserved.
学科主题	光学薄膜
收录类别	EI
语种	英语
公开日期	2009-09-22
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/4686]
专题	上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式 GB/T 7714	Zhang Feng,Zhu Huili,Yang Weifeng,et al. Al2O3/SiO2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC[J]. appl. surf. sci.,2008,254(10):3045, 3048.
APA	Zhang Feng.,Zhu Huili.,Yang Weifeng.,Wu Zhengyun.,Qi Hongji.,...&邵建达.(2008).Al2O3/SiO2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC.appl. surf. sci.,254(10),3045.
MLA	Zhang Feng,et al."Al2O3/SiO2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC".appl. surf. sci. 254.10(2008):3045.