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	Influence of deposition temperature on the structure and optical properties of HfO/sub 2/ thin films
	Jie Ni ; Zheng-cao Li ; Zheng-jun Zhang
	2010-10-12 ; 2010-10-12
关键词	Experimental/ amorphous state dielectric thin films electron beam deposition hafnium compounds refractive index surface morphology/ amorphous hafnium oxide thin films Si (001) substrates electron beam evaporation surface morphology refractive index temperature 250 C temperature 300 C HfO/sub 2/ Si/ A7865P Optical properties of other inorganic semiconductors and insulators (thin films/low-dimensional structures) A6820 Solid surface structure A7755 Dielectric thin films A6855 Thin film growth, structure, and epitaxy A8115G Vacuum deposition A7820D Optical constants and parameters (condensed matter) B2810 Dielectric materials and properties/ temperature 5.2315E+02 K temperature 5.7315E+02 K/ HfO2/bin O2/bin Hf/bin O/bin Si/sur Si/el
中文摘要	Hafnium oxide (HfO/sub 2/) thin films were deposited on Si (001) substrates by electron beam evaporation at various growth temperatures. It was found that the film was amorphous when deposited at temperatures lower than 200 degrees C. It was polycrystalline when deposited at 250 degrees C and 300 degrees C. At temperatures above 400 degrees C, it was grown preferably along the [111] direction. The influence of growth temperature on the surface morphology and optical property was also investigated.
语种	英语
出版者	Springer ; China
内容类型	期刊论文
源URL	[http://hdl.handle.net/123456789/78125]
专题	清华大学
推荐引用方式 GB/T 7714	Jie Ni,Zheng-cao Li,Zheng-jun Zhang. Influence of deposition temperature on the structure and optical properties of HfO/sub 2/ thin films[J],2010, 2010.
APA	Jie Ni,Zheng-cao Li,&Zheng-jun Zhang.(2010).Influence of deposition temperature on the structure and optical properties of HfO/sub 2/ thin films..
MLA	Jie Ni,et al."Influence of deposition temperature on the structure and optical properties of HfO/sub 2/ thin films".(2010).

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