Optimization of thin-film design for multi-layer dielectric grating | |
Liu SJ(刘世杰) ; Ma JY(麻健勇) ; Shen Zicai ; Jin Yunxia ; Shao JD(邵建达) ; Fan ZX(范正修) | |
刊名 | appl. surf. sci. |
2007 | |
卷号 | 253期号:7页码:3642 |
关键词 | multi-layer dielectric grating thin film diffraction efficiency and laser damage |
ISSN号 | 0169-4332 |
中文摘要 | thin-film design used to fabricate multi-layer dielectric (mld) gratings should provide high transmittance during holography exposure, high reflectance at use wavelength and sufficient manufacturing latitude of the grating design making the mld grating achieve both high diffraction efficiency and low electric field enhancement. based on a (hll)h-9 design comprising of quarter-waves of high-index material and half-waves of low-index material, we obtain an optimum mld coating meeting these requirements by inserting a matching layer being half a quarter-wave of al2o3 between the initial design and an optimized hfo2 top layer. the optimized mld coatings exhibits a low reflectance of 0.017% under photoresist at the exposure angle of 17.8 degrees for 413 nm light and a high reflectance of 99.61% under air at the use angle of 51.2 degrees for 1053 nm light. numerical calculation of intensity distribution in the photoresist coated on the mld film during exposure shows that standing-wave patterns are greatly minimized and thus simulation profile of photoresist gratings after development demonstrates smoother shapes with lower roughness. furthermore, a mld gratings with grooves etched into the top layer of this mld coating provides a high diffraction efficiency of 99.5% and a low electric field enhancement ratio of 1.53. this thin-film design shows perfect performances and can be easily fabricated by e-beam evaporation. (c) 2006 elsevier b.v. all rights reserved. |
学科主题 | 光学薄膜 |
收录类别 | EI |
语种 | 英语 |
WOS记录号 | WOS:000244381700046 |
公开日期 | 2009-09-22 |
内容类型 | 期刊论文 |
源URL | [http://ir.siom.ac.cn/handle/181231/4538] |
专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
推荐引用方式 GB/T 7714 | Liu SJ,Ma JY,Shen Zicai,et al. Optimization of thin-film design for multi-layer dielectric grating[J]. appl. surf. sci.,2007,253(7):3642, 3648. |
APA | 刘世杰,麻健勇,Shen Zicai,Jin Yunxia,邵建达,&范正修.(2007).Optimization of thin-film design for multi-layer dielectric grating.appl. surf. sci.,253(7),3642. |
MLA | 刘世杰,et al."Optimization of thin-film design for multi-layer dielectric grating".appl. surf. sci. 253.7(2007):3642. |
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