1064nm倍频波长分离膜的制备与性能研究

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 光学薄膜技术研究与发展中心

	1064nm倍频波长分离膜的制备与性能研究; Fabrication and properties study of harmonic beam splitter at 1064 nm
	马小凤 ; 张东平 ; 王英剑 ; 范书海 ; 高卫东 ; 范正修 ; 邵建达
刊名	中国激光
	2005
卷号	32 期号:6 页码:835
关键词	薄膜 thin films 倍频波长分离膜 harmonic beam splitter 弱吸收 weak absorption 激光损伤阈值 laser-induced damage threshold
ISSN号	0258-7025
其他题名	Fabrication and properties study of harmonic beam splitter at 1064 nm
中文摘要	通过对主膜系添加匹配层并借助计算机对膜系进行优化，设计出结构规整、性能优良的1064ilm倍频波长分离膜。用电子束蒸发及光电极值监控技术在K9玻璃基底上沉积薄膜，将样品置于空气中在260℃温度下进行3h热退火处理。然后用Lambda 900分光光度计测量了样品的光谱性能；用表面热透镜(STL)技术测量了样品的弱吸收值；用调Q脉冲激光装置测试了样品的抗激光损伤阈值(LIDT)。实验结果发现，样品的实验光谱性能与理论光谱性能有很好的一致性。退火前后其光谱性能几乎没有发生温漂，说明薄膜的温度稳定性好；同时退火使; A harmonic beam splitter with a simply regular structure and good optical characteristics was designed by adding matching layers between the basic stack and its media and optimizing with a computed-aided film stack design procedure. Coatings were deposited on K9 glass substrates by electron beam evaporation and photoelectric maximum control method, and then annealed in air at 260 ℃ temperature for three hours. The optical properties of coatings were characterized with a Lambda 900 spectrophotometer, the weak absorption of coatings was measured by surface thermal lensing technique (STL), and laser-induced damage threshold (LIDT) was assessed using 1064 nm Q-switch pulsed laser at a pulse length of 12 ns. It was found that a good agreement between the theoretical and the experimental transmittance was obtained, there was almost no shift for the center wavelength after annealing at 260 ℃, which showed the sample had a good temperature stability, the absorption of the coating decreased after annealing, and a remarkable increase of LIDT was found with the decrease of absorption. The experimental results as well as the theoretical ones indicated that it was a good method to add matching layers to the basic stack for a harmonic beam splitter at 1064 nm.
学科主题	光学薄膜
分类号	O484
收录类别	ei
语种	中文
公开日期	2009-09-22
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/4458]
专题	上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式 GB/T 7714	马小凤,张东平,王英剑,等. 1064nm倍频波长分离膜的制备与性能研究, Fabrication and properties study of harmonic beam splitter at 1064 nm[J]. 中国激光,2005,32(6):835, 838.
APA	马小凤.,张东平.,王英剑.,范书海.,高卫东.,...&邵建达.(2005).1064nm倍频波长分离膜的制备与性能研究.中国激光,32(6),835.
MLA	马小凤,et al."1064nm倍频波长分离膜的制备与性能研究".中国激光 32.6(2005):835.