Fast plasma sintering deposition of nano-structured silicon carbide coatings

CORC > 力学研究所 > 中国科学院力学研究所 > 等离子体与燃烧中心(2009-2011)

	Fast plasma sintering deposition of nano-structured silicon carbide coatings
	Huang HJ(黄河激); Fu ZQ(付志强); Pan WX(潘文霞); Wu CK(吴承康); Huang HJ(黄河激)
	2011-01-06
会议名称	18th International Vacuum Congress
会议日期	2010-08-23~2010-08-27
通讯作者邮箱	huang@imech.ac.cn
会议地点	北京
关键词	reduced-pressure plasma sintering deposition silicon carbide coating ultrafast deposition
通讯作者	黄河激
中文摘要	Fast plasma sintering deposition of SiC nano-structured coatings was achieved using a specially designed non-transferred dc plasma torch operated at reduced pressure. Employing the Taguchi method, the deposition parameters were optimized and verified. With the optimized combination of deposition parameters, homogeneous SiC coatings were deposited on relatively large area substrates of Φ50 mm and 50×50 mm with a deposition rate as high as 20 μm/min. Ablation test showed that such coatings can be used as oxidation resistance coatings in high temperature oxidizing environment.
收录类别	CPCI
合作状况	其它
会议录	18th International Vacuum Congress.北京.2010-08-23~2010-08-27.
学科主题	交叉与边缘领域的力学
语种	英语
内容类型	会议论文
源URL	[http://dspace.imech.ac.cn/handle/311007/43279]
专题	力学研究所_等离子体与燃烧中心(2009-2011)
通讯作者	Huang HJ(黄河激)
推荐引用方式 GB/T 7714	Huang HJ,Fu ZQ,Pan WX,et al. Fast plasma sintering deposition of nano-structured silicon carbide coatings[C]. 见:18th International Vacuum Congress. 北京. 2010-08-23~2010-08-27.