Enhanced photoelectrochemical performance of planar p-Silicon by APCVD deposition of surface mesoporous hematite coating

CORC > 上海硅酸盐研究所 > 中国科学院上海硅酸盐研究所 > 高性能陶瓷和超微结构国家重点实验室 > 期刊论文

	Enhanced photoelectrochemical performance of planar p-Silicon by APCVD deposition of surface mesoporous hematite coating
	Li, Shipu 1; Zhang, Peng 1; Xie, Xiaofeng 2; Song, Xuefeng 1; Liu, Jing 1; Zhao, Liping 1; Chen, Han 1; Gao, Lian 1
刊名	APPLIED CATALYSIS B-ENVIRONMENTAL
	2017
卷号	200 页码:372-377
关键词	Planar Si alpha-Fe2O3 Catalysts Photoelectrochemistry Hydrogen
英文摘要	Pt nanoparticles are the most frequently used catalyst for Si photocathode. Alternative catalyst based on transition metal or metal oxide as cathode catalyst is greatly desired to replace Pt. A mesoporous alpha-Fe2O3 thin film (80 nm) was deposited on the surface of planar p-Si using a facile atmospheric pressure chemical vapor deposition (APCVD) method through pyrolysis of ferrocene. The planar Si photocathode shows a 400% enhancement in photocurrent at 1.0 V-RHE and an anodic onset potential shift of 0.5 V upon deposition of surface mesoporous alpha-Fe2O3 layer. This composite photo electrode also shows superior photoelectrochemical performance to the Pt/planar Si photoelectrode. (C) 2016 Elsevier B.V. All rights reserved.
WOS标题词	Science & Technology ; Physical Sciences ; Technology
类目[WOS]	Chemistry, Physical ; Engineering, Environmental ; Engineering, Chemical
研究领域[WOS]	Chemistry ; Engineering
关键词[WOS]	ALPHA-FE2O3 NANOTUBE ARRAYS ; WATER OXIDATION ; HYDROTHERMAL SYNTHESIS ; HYDROGEN-PRODUCTION ; PHOTOCATHODE ; PHOTOANODES ; FE2O3 ; FILMS ; NANOSTRUCTURES ; PHOTOOXIDATION
收录类别	SCI
语种	英语
WOS记录号	WOS:000384775600038
内容类型	期刊论文
源URL	[http://ir.sic.ac.cn/handle/331005/22004]
专题	上海硅酸盐研究所_高性能陶瓷和超微结构国家重点实验室_期刊论文
作者单位	1.Shanghai Jiao Tong Univ, Sch Mat Sci & Engn, State Key Lab Met Matrix Composites, Shanghai 200240, Peoples R China 2.Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
推荐引用方式 GB/T 7714	Li, Shipu,Zhang, Peng,Xie, Xiaofeng,et al. Enhanced photoelectrochemical performance of planar p-Silicon by APCVD deposition of surface mesoporous hematite coating[J]. APPLIED CATALYSIS B-ENVIRONMENTAL,2017,200:372-377.
APA	Li, Shipu.,Zhang, Peng.,Xie, Xiaofeng.,Song, Xuefeng.,Liu, Jing.,...&Gao, Lian.(2017).Enhanced photoelectrochemical performance of planar p-Silicon by APCVD deposition of surface mesoporous hematite coating.APPLIED CATALYSIS B-ENVIRONMENTAL,200,372-377.
MLA	Li, Shipu,et al."Enhanced photoelectrochemical performance of planar p-Silicon by APCVD deposition of surface mesoporous hematite coating".APPLIED CATALYSIS B-ENVIRONMENTAL 200(2017):372-377.